Stress distributions in the strained InGaAs PMOSFET with source/drain (S/D) stressors for various lengths and widths were studied with 3D stress simulations. The resulting mobility improvement was analyzed. Compressive stress along the transport direction was found to dominate the hole mobility improvement for the wide width devices. Stress along the vertical direction perpendicular to the gate oxide was found to affect the mobility the least, while stress along the width direction enhanced in the middle wide width region. The impact of channel width and length on performance improvements such as the mobility gain was analyzed using the Kubo-Greenwood formalism accounting for nonpolar hole-phonon scattering (acoustic and optical), surface roughness scattering, polar phonon scattering, alloy scattering and remote phonon scattering. The novelty of this paper is studying the impact of channel width and length on the performance of InGaAs PMOSFET such as mobility and exploring physical insight for scaling the future III-V CMOS devices.
The novel thin film solar cell with a nanoplate structure that can solve the conflict between the light absorption and the carrier transport in amorphous silicon thin film solar cell was investigated by TCAD simulations. This new structure has n-type amorphous silicon nanoplate array on the substrate, and p-type amorphous silicon-carbon as window layer and intrinsic amorphous silicon as absorption layer are sequentially grown along the surface of each n-type amorphous silicon nanoplate. Under AM 1.5 G sunlight illumination, the light is absorbed along the vertical direction of nanoplate while the carrier transport is along the horizontal direction. Therefore, nanoplate with the larger height can absorb most of the sunlight. The advantage of this novel structure is that the thickness of the solar cell can be used as thin as possible for effective transport of photo-generated carriers in comparison with the planer one.
The novel thin-film solar cell was investigated with a nanorod structure that could solve the conflict between light absorption and carrier transport in the amorphous silicon (a-Si)/amorphous silicon-germanium (a-SiGe) tandem thin-film solar cell. This structure has an n-type a-Si nanorod array on the substrate, and an a-SiOx p-layer and an a-SiGe i-layer are sequentially grown along the surface of each n-type a-Si nanorod, for the bottom cell. After the above bottom-cell process, a similar process is used to fabricate an amorphous Si p-i-n top cell on the bottom cell. Under sunlight illumination, the light is absorbed along the vertical direction of the nanorod, but as the carrier transport is along the horizontal direction, the nanorod may absorb most of the sunlight. In the meantime, the solar cell is still thin enough for the effective transport of photogenerated carriers.
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