We experiment with using sensors and a machine learning algorithm to detect and label turns in alpine skiing. Previous work in this area involves data from more sensors and turns are detected using either a physics-based model or custom signal processing algorithm. We recorded accelerometer and gyroscope data using a single sensor placed on a skier's knee. Left and right turns in the data were labeled for use in machine learner. Although skiing data proved to be difficult to label precisely, a classifier trained on 37 labelled examples correctly label all 13 examples from a different test data set with 2 false positives. This method allows for the use of a single sensor and may be generalizable to other applications.
This paper explores how the most recent Star Wars films released after Disney's acquisition of Lucasfilm, Episode VII: The Force Awakens and Episode VIII: The Last Jedi, serve as a fertile discursive space for the growing anxieties over the rise of the white nationalist movement in the United States over the last decade. Unlike previous Star Wars trilogies, Episodes VII and VIII foreground the "Other" in juxtaposition to the whiteness that the Empire and First Order represent both figuratively and literally. By incorporating a more diverse array of characters, such as people of color, women, and immigrants, the Resistance is juxtaposed against the mostly white, mostly male First Order in these films. This has led to the First Order being read by many as a symbol of the white nationalism movement, as it strives to maintain its own perceived superiority over the resistance of "Others."
A commercially available positive photoresist, Polychrome 129 SF, has been evaluated as both a positive electron beam resist and photoresist. The photoresist sensitivity, measured uniquely for a given developer based upon image dimensional control, is determined to be less than that of AZ 1350, under as nearly equivalent conditions as possible.The E -beam resist sensitivity is lower than that of PMMA reference, but the resist possesses good resolution.Near vertical edge wall profiles are obtained for 1-micrometer lines, but no undercutting is ever achieved regardless of electron charge density magnitude.The resist is capable of submicron line and space E -beam resolution, and 0.50 -0.75 micrometer wide isolated line patterns can be routinely achieved.
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