Nanocrystalline δ-Bi2O3 thin films have been deposited onto Si (100) and quartz substrates by reactive sputtering. The structural characteristics and thermal stability of the thin films have been investigated by x-ray diffraction and Raman spectra. It was found that the δ-Bi2O3 thin films could exist stably below 200 °C and undergo a phase transition sequence δ → β → α with increasing annealing temperature beyond 200 °C. These phase transitions were further confirmed by optical constant and optical band gap studies.
Photoluminescence (PL) properties of ZnO thin films on Si substrate with and without an indium tin oxide (ITO) buffer layer, prepared under different oxygen partial pressures in the sputtering gas, were studied. It was found that PL characteristics of ZnO thin films depend on oxygen partial pressure and substrate, and the PL peak in the ultraviolet region has a strong red-shift with increasing excitation intensity on the glass and Si substrates with the ITO buffer layer, and the PL intensity increases with the increasing measuring cycle. Enhanced luminescence efficiency of ZnO thin films on the substrates with ITO buffer layer measured at different cycles can be obtained by thermal annealing.
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