The structure of self-assembled monolayers (SAMs) of undecylenic acid methyl ester (SAM-1) and undec-10-enoic acid 2-bromo-ethyl ester (SAM-2) grown on hydrogen-passivated Si(111) were studied by X-ray reflectivity (XRR), X-ray standing waves (XSW), X-ray fluorescence (XRF), atomic force microscopy, and X-ray photoelectron spectroscopy (XPS). The two different SAMs were grown by immersion of H-Si(111) substrates into the two different concentrated esters. UV irradiation during immersion was used to create Si dangling bond sites that act as initiators of the surface free-radical addition process that leads to film growth. The XRR structural analysis reveals that the molecules of SAM-1 and SAM-2 respectively have area densities corresponding to 50% and 57% of the density of Si(111) surface dangling bonds and produce films with less than 4 angstroms root-mean-square roughness that have layer thicknesses of 12.2 and 13.2 angstroms. Considering the molecular lengths, these thicknesses correspond to a 38 degrees and 23 degrees tilt angle for the respective molecules. For SAM-2/Si(111) samples, XRF analysis reveals a 0.58 monolayer (ML) Br total coverage. Single-crystal Bragg diffraction XSW analysis reveals (unexpectedly) that 0.48 ML of these Br atoms are at a Si(111) lattice position height that is identical to the T1 site that was previously found by XSW analysis for Br adsorbed onto Si(111) from a methanol solution and from ultrahigh vacuum. From the combined XPS, XRR, XRF, and XSW evidence, it is concluded that Br abstraction by reactive surface dangling bonds competes with olefin addition to the surface.
Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed.
Scanning probe microscopy (SPM) is a widely used experimental technique for characterizing and fabricating nanostructures on surfaces. In particular, due to its ability to spatially map variations in materials properties with nanometer spatial resolution, SPM is particularly well suited to probe the subcomponents and interfaces of hybrid nanomaterials, i.e., materials that are made up of distinct nanometer scale components with distinguishable properties. In addition, the interaction of the SPM tip with materials can be intentionally tuned such that local surface modification is achieved. In this manner, hybrid nanostructures can also be fabricated on solid substrates using SPM. This report reviews recent developments in the characterization and fabrication of hybrid nanomaterials with SPM. Specific attention is given to nanomaterials that consist of both organic and inorganic components including individual biomolecules mounted on inorganic substrates. SPM techniques that are particularly well suited for characterizing the mechanical and electrical properties of such hybrid systems in atmospheric pressure environments are highlighted, and specific illustrative examples are provided. This review concludes with a brief discussion of the remaining challenges and promising future prospects for this field.
Conductive atomic force microscope (AFM) nanopatterning on hydrogen‐terminated silicon in a hydrophobic organic solvent under ambient conditions produces features consistent with AFM field‐induced oxidation. The growth rate of the oxide features (see figure) exhibits modulation consistent with a space‐charge‐limited growth mechanism.
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