A simple procedure to elaborate robust ultraflat gold surface without clean room facilities is presented. Self-assembled 3-mercaptopropytriethoxysilane (MPTMS) on silicon was used as a buffer layer on which gold was sputtered using a common sputter-coating apparatus. The optimization of the sample position into the chamber of the sputtering machine yielded the formation of a thin (approximately 8 nm) gold layer. The characterization of the resulting gold surface (i.e., AFM, X-ray reflectivity, and diffraction) has demonstrated its high smoothness (<0.7 nm) over a large scale with a preferred (111) orientation. The robustness of the substrate toward organic solvents and thermal treatment was also tested. The ability of these surfaces to be used as substrates for high-resolution surface modification was confirmed by functionalizing the gold surface using the dip pen nanolithography process.
EPR investigations of the photoreduction of Ti(4+) into Ti(3+) under UV irradiation were carried out on three titanium-based materials for which the initial concentration of Ti(4+) was defined in the ternary phase diagram (TiOCl(2), H(2)O, DMF). The kinetics of this photoreduction was monitored at 200 K and related to the initial concentration of Ti(4+) in the solution. This study was complemented by a multi-approach EPR method (pulsed electron paramagnetic resonance (EPR), pulsed electron nuclear double resonance, and hyperfine sublevel correlation spectroscopy (HYSCORE)) with the aim of probing the proton environment of the Ti(3+) ions. Indeed, many species such as H(2)O, OH(-), HCOO(-) are located in the immediate vicinity of Ti(3+). Although we found that a distribution of g tensors was involved, for simplicity, two types of g tensor were used to describe the main features of the EPR signal related to the paramagnetic ions. Additionally, we have evidenced that two kinds of protons are identified next to Ti(3+) species, with specific distances determined from the hyperfine coupling parameters obtained by the HYSCORE method.
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