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Reagentless micropatterning of hydrogen-terminated Si(111) via UV irradiation through a photomask has proven
to be a convenient strategy for the preparation of ordered bicomponent monolayers. The success of this technique
relies upon the differential rate of reaction of an alkene with the hydrogen-terminated and photooxidized regions of
the surface. Monolayer formation can be accomplished under either thermal or photochemical conditions. It was
observed that, after 3 h, reaction in neat alkene solution irradiation (Rayonet, 300 nm) afforded the expected patterned
surface, while thermal conditions (150 °C) resulted in a partial loss of pattern fidelity. Monolayer properties and
formation were studied on oxidized and hydrogen-terminated silicon under thermal and photochemical initiation, by
contact angle, ellipsometry, Fourier transform infrared spectroscopy, high-resolution electron energy loss spectroscopy,
and X-ray photoelectron spectroscopy. Results show that alkenes add to silanol groups on the silica surface in a manner
consistent with acid catalysis: once attached to the surface, the silica oxidized the hydrocarbon.
Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca.
Questions? Contact the NRC Publications Archive team atPublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. If you wish to email the authors directly, please see the first page of the publication for their contact information.
NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous.http://doi.org/10.1021/jp0537658Access and use of this website and the material on it are subject to the Terms and Conditions set forth at Selective adsorption of pyridine at isolated reactive sites on Si(100) Miwa, Jill A.; Eves, Brian J.; Rosei, Federico; Lopinski, Gregory P.http://nparc.cisti-icist.nrc-cnrc.gc.ca/fra/droits L'accès à ce site Web et l'utilisation de son contenu sont assujettis aux conditions présentées dans le site
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