While InGaN/GaN blue and green light-emitting diodes (LEDs) are commercially available, the search for an efficient red LED based on GaN is ongoing. The realization of this LED is crucial for the monolithic integration of the three primary colors and the development of nitride-based full-color high-resolution displays. In this perspective, we will address the challenges of attaining red luminescence from GaN under current injection and the methods that have been developed to circumvent them. While several approaches will be mentioned, a large emphasis will be placed on the recent developments of doping GaN with Eu3+ to achieve an efficient red GaN-based LED. Finally, we will provide an outlook to the future of this material as a candidate for small scale displays such as mobile device screens or micro-LED displays.
The nature of Eu incorporation and resulting luminescence efficiency in GaN has been extensively investigated. By performing a comparative study on GaN:Eu samples grown under a variety of controlled conditions, and using a variety of experimental techniques, the configuration of the majority site has been concluded to contain a nitrogen vacancy (V N). The nitrogen vacancy can appear in two symmetries, which has a profound impact on the luminescence and magnetic properties of the sample. The structure of the minority site has also been identified. We propose that, for both sites, the excitation efficiency of the red Eu emission is improved by the presence of donor-acceptor pairs in the close vicinity of the Eu. V
The detrimental influence of oxygen on the performance and reliability of V/III nitride based devices is well known. However, the influence of oxygen on the nature of the incorporation of other co-dopants, such as rare earth ions, has been largely overlooked in GaN. Here, we report the first comprehensive study of the critical role that oxygen has on Eu in GaN, as well as atomic scale observation of diffusion and local concentration of both atoms in the crystal lattice. We find that oxygen plays an integral role in the location, stability, and local defect structure around the Eu ions that were doped into the GaN host. Although the availability of oxygen is essential for these properties, it renders the material incompatible with GaN-based devices. However, the utilization of the normally occurring oxygen in GaN is promoted through structural manipulation, reducing its concentration by 2 orders of magnitude, while maintaining both the material quality and the favorable optical properties of the Eu ions. These findings open the way for full integration of RE dopants for optoelectronic functionalities in the existing GaN platform.
A modification of the growth structure of Eu-doped GaN (GaN:Eu) from a monolayer to a multilayer structure (MLS) consisting of alternating GaN and GaN:Eu, was shown to enhance the emission properties. Similarly, lowering the growth temperature of the GaN:Eu to 960°C nearly doubled the photoluminescence emission intensity, and also enhanced device performance. Hence, to design a higher power GaN:Eu red LED, a multilayer structure consisting of 40 pairs of alternating GaN and GaN:Eu was grown at 960°C. This combination resulted in the fabrication of an LED with a maximum output power of 110 μW, which is 5.8 times more output power per GaN:Eu layer thickness as compared to the best previously reported device. Moreover, it was found that the MLS sample grown at 960°C maintained a high crystal quality with low surface roughness, which enabled an increase in the number of pairs from 40 pairs to 100 pairs. An MLS-LED consisting of 100 pairs of alternating GaN/GaN:Eu layers was successfully fabricated, and had a maximum output power of 375 μW with an external quantum efficiency of 4.6%. These are the highest values reported for this system.
The influence of growth temperature on the surface morphology and luminescence properties of Eu-doped GaN layers grown by organometallic vapor phase epitaxy was investigated. By using a Eu source that does not contain oxygen in its molecular structure, and varying the growth temperature, the local defect environment around the Eu3+ ions was manipulated, yielding a higher emission intensity from the Eu3+ ions and a smoother sample surface. The optimal growth temperature was determined to be 960 °C and was used to fabricate a GaN-based red light-emitting diode with a significantly higher output power.
We demonstrate the use of hydrogen induced changes in the emission of isoelectric Eu ions, in Mg-doped p-type GaN, as a powerful probe to study the dynamics of hydrogen movement under electron beam irradiation. We identify, experimentally, a two-step process in the dissociation of Mg-H complexes and propose, based on density functional theory, that the presence of minority carriers and resulting charge states of the hydrogen drives this process. OCIS codes: (310.3840) Materials and process characterization; (310.6188) Spectral properties; (310.6845) Thin film devices and applications; (160.5690) Rare-earth-doped material;
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