The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26 33 mm 2 , enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.
We demonstrate the in situ detection of cold 87 Rb atoms near a dielectric surface using the absorption of a weak, resonant evanescent wave. We have used this technique in time of flight experiments determining the density of atoms falling on the surface. A quantitative understanding of the measured curve was obtained using a detailed calculation of the evanescent intensity distribution. We have also used it to detect atoms trapped near the surface in a standing-wave optical dipole potential. This trap was loaded by inelastic bouncing on a strong, repulsive evanescent potential. We estimate that we trap 1.5 × 10 4 atoms at a density 100 times higher than the falling atoms.
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