This review explores the performance and reliability of power semiconductor devices required to enable the electrification of heavy goods vehicles (HGVs). HGV electrification can be implemented using (i) batteries charged with ultra-rapid DC charging (350 kW and above); (ii) road electrification with overhead catenaries supplying power through a pantograph to the HGV powertrain; (iii) hydrogen supplying power to the powertrain through a fuel cell; (iv) any combination of the first three technologies. At the heart of the HGV powertrain is the power converter implemented through power semiconductor devices. Given that the HGV powertrain is rated typically between 500 kW and 1 MW, power devices with voltage ratings between 650 V and 1200 V are required for the off-board/on-board charger’s rectifier and DC-DC converter as well as the powertrain DC-AC traction inverter. The power devices available for HGV electrification at 650 V and 1.2 kV levels are SiC planar MOSFETs, SiC Trench MOSFETs, silicon super-junction MOSFETs, SiC Cascode JFETs, GaN HEMTs, GaN Cascode HEMTs and silicon IGBTs. The MOSFETs can be implemented with anti-parallel SiC Schottky diodes or can rely on their body diodes for third quadrant operation. This review examines the various power semiconductor technologies in terms of losses, electrothermal ruggedness under short circuits, avalanche ruggedness, body diode and conduction performance.

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Bias temperature instability (BTI) in SiC MOSFETs has come under significant academic and industrial research. Threshold voltage (VTH) shift due to gate voltage stress has been demonstrated in several studies investigating gate oxide reliability in SiC MOSFETs. Results have shown positive.VTH shift occurs due to electron trapping (PBTI), and negative VTH shift occurs due to hole trapping (NBTI). In this paper, VTH shift is studied for unipolar and bipolar gate pulses with frequencies ranging from 1Hz to 100 kHz. The turn-OFF voltage for the unipolar VGS pulse is 0 V. In the case of the bipolar VGS pulses, two turn-OFF voltages are investigated, namely VGS-OFF = -3V and VGS-OFF= -5V. VTH shift is measured after 1000 seconds with recovery times in the range of 20 milliseconds, and preconditioning is performed before VTH measurement. These measurements have been performed at 25°C and 150°C on a commercially available SiC Planar MOSFET and a SiC Trench MOSFET. The results show that -3 V is enough for de-trapping sufficient electrons while -5V results in increased NBTI, which is accelerated by higher temperatures.

This paper investigates the peculiarities and challenges of accurate threshold voltage (VTH) measurement after gate bias stress in SiC MOSFETs and GaN e-HEMTs. Traditional techniques historically used in silicon MOSFETs involve test sequences typically comprising preconditioning, VTH measurement, gate voltage stress and VTH measurement after stress. However, with Wide bandgap (WBG) devices like SiC and GaN transistors, the repeatability of VTH measurement, the impact of VTH measurement duration, delay between successive measurements and the role of preconditioning on the accuracy of VTH are currently under study. With current industrial and academic research interest in bias temperature instability in WBG devices, this paper provides significant insight into how repeatable VTH measurement is in WBG devices since measuring VTH can change it. The impact of repeated measurements on the cumulative VTH shift is investigated in both WBG technologies with different delay times between successive measurements with and without preconditioning. Unipolar and Bipolar preconditioning pulses are compared regarding VTH measurement in SiC MOSFETs.