The aggressive scaling of silicon-based nanoelectronics has reached the regime where device function is affected not only by the presence of individual dopants, but more critically their position in the structure. The quantitative determination of the positions of subsurface dopant atoms is an important issue in a range of applications from channel doping in ultra-scaled transistors to quantum information processing, and hence poses a significant challenge. Here, we establish a metrology combining low-temperature scanning tunnelling microscopy (STM) imaging and a comprehensive quantum treatment of the dopant-STM system to pin-point the exact lattice-site location of sub-surface dopants in silicon. The technique is underpinned by the observation that STM images of sub-surface dopants typically contain many atomic-sized features in ordered patterns, which are highly sensitive to the details of the STM tip orbital and the absolute lattice-site position of the dopant atom itself. We demonstrate the technique on two types of dopant samples in silicon -the first where phosphorus dopants are placed with high precision, and a second containing randomly placed arsenic dopants. Based on the quantitative agreement between STM measurements and multi-million-atom calculations, the precise lattice site of these dopants is determined, demonstrating that the metrology works to depths of about 36 lattice planes. The ability to uniquely determine the exact positions of subsurface dopants down to depths of 5 nm will provide critical knowledge in the design and optimisation of nanoscale devices for both classical and quantum computing applications.As we approach the ultimate regime of Feynman's vision 1 of nanotechnology based on atom-by-atom fabrication 2-5 , there is a critical need to match advances in miniaturisation with atomically precise metrology. In conventional CMOS 6 and tunnelling field effect 7,8 transistors the key relationship between doping profile and performance is now dominated by the positions of just a few dopant atoms, and currently cannot be quantitatively determined. Beyond conventional nanoelectronic devices, in quantum processors based on phosphorus dopants in silicon 9 the precise locations of the individual dopants is critical to the design and operation of spin-based quantum logic gates. Previous studies on locating subsurface dopant positions in semiconductors either provide donor depths based on statistical evidence 10 , or only qualitatively locate dopants within a few nanometers region (of the order of 2.5 nm or more)11 . The key metrological challenge in all of the ultra-scaled applications is the ability to determine the position of dopant atoms in the silicon crystal substrate with lattice-site precision, which will drastically transform our understanding at the most fundamental scale leading to devices with optimised functionalities.In this work, we present an atomically precise metrology and demonstrate the pinpointing of the position of subsurface phosphorous (P) and arsenic (As) dopants in si...
In this article we have investigated the electrical control of the exchange coupling (J) between donor-bound electrons in silicon with a detuning gate bias, crucial for the implementation of the two-qubit gate in a silicon quantum computer. We found that the asymmetric 2P-1P system provides a highly tunable exchange curve with mitigated J-oscillation, in which 5 orders of magnitude change in the exchange coupling can be achieved using a modest range of electric field (3 MV/m) for~15-nm qubit separation. Compared with the barrier gate control of exchange in the Kane qubit, the detuning gate design reduces the gate density by a factor of~2. By combining large-scale atomistic tight-binding method with a full configuration interaction technique, we captured the full two-electron spectrum of gated donors, providing state-of-the-art calculations of exchange energy in 1P-1P and 2P-1P qubits.npj Quantum Information (2016) 2, 16008; doi:10.1038/npjqi.2016.8; published online 12 April 2016 INTRODUCTION Donor qubits in silicon are promising candidates for spin-based quantum computation as they have exceptionally long T 1 (refs 1-3) and T 2 times 4-6 and offer both electron and nuclear spins for encoding quantum information 5-8 utilising commonly used silicon device technology. With recent demonstration of single qubits in silicon with both electronic and nuclear spins of donors, 5,7 the next biggest challenge is to demonstrate two-qubit gates based on the exchange interaction. Ideally, the exchange coupling J in a two-qubit gate needs to be tuned electrically by several orders of magnitude between an 'Off' and an 'On' state within a small and realisable bias range. To achieve this, the popular Kane architecture uses a J-gate between two phosphorus donors to tune the J-coupling. Recently A-gates that tune the hyperfine interaction for individual qubits have been demonstrated. 9 However, in the long run such a J-and A-gate architecture leads to a high gate density, requiring ultra-small gate widths to minimise electrical cross-talk between gates, and precise donor positioning relative to gates. Moreover, the tunability of the exchange coupling is limited both by the electric field range the J-gate can produce and by the field ionisation of the electrons to the surface. Previous calculations have also shown that the J-coupling oscillates as a function of donor separation due to crystal momentum states, 10 and is therefore sensitive to atomic-scale placement errors. All these issues lead to severe constraints in the implementation of a two-qubit gate in donors.In this work, we introduce an alternative design for an exchange gate in a two-qubit donor system, which allows flexibility in device fabrication and in tuning the exchange coupling. In principle, this new design can (1) eliminate the need for additional J-gates between the donors, (2) function with a range of donor separations, (3) provide an~5 orders of magnitude J-tunability within a modest E-field range of~3 MV/m and lowered 'Off' state exchange and (4) mitigate th...
Tunneling is a fundamental quantum process with no classical equivalent, which can compete with Coulomb interactions to give rise to complex phenomena. Phosphorus dopants in silicon can be placed with atomic precision to address the different regimes arising from this competition. However, they exploit wavefunctions relying on crystal band symmetries, which tunneling interactions are inherently sensitive to. Here we directly image lattice-aperiodic valley interference between coupled atoms in silicon using scanning tunneling microscopy. Our atomistic analysis unveils the role of envelope anisotropy, valley interference and dopant placement on the Heisenberg spin exchange interaction. We find that the exchange can become immune to valley interference by engineering in-plane dopant placement along specific crystallographic directions. A vacuum-like behaviour is recovered, where the exchange is maximised to the overlap between the donor orbitals, and pair-to-pair variations limited to a factor of less than 10 considering the accuracy in dopant positioning. This robustness remains over a large range of distances, from the strongly Coulomb interacting regime relevant for high-fidelity quantum computation to strongly coupled donor arrays of interest for quantum simulation in silicon.
Exchange coupling is a key ingredient for spin-based quantum technologies since it can be used to entangle spin qubits and create logical spin qubits. However, the influence of the electronic valley degree of freedom in silicon on exchange interactions is presently the subject of important open questions. Here we investigate the influence of valleys on exchange in a coupled donor/quantum dot system, a basic building block of recently proposed schemes for robust quantum information processing. Using a scanning tunneling microscope tip to position the quantum dot with subnm precision, we find a near monotonic exchange characteristic where lattice-aperiodic modulations associated with valley degrees of freedom comprise less than 2 % of exchange. From this we conclude that intravalley tunneling processes that preserve the donor's ±x and ±y valley index are filtered out of the interaction with the ±z valley quantum dot, and that the ±x and ±y intervalley processes where the electron valley index changes are weak. Complemented by tight-binding calculations of exchange versus donor depth, the demonstrated electrostatic tunability of donor/QD exchange can be used to compensate the remaining intravalley ±z oscillations to realise uniform interactions in an array of highly coherent donor spins. arXiv:1706.09261v2 [cond-mat.mes-hall] 1 Sep 2018
Two-electron states bound to donors in silicon are important for both two qubit gates and spin readout. We present a full configuration interaction technique in the atomistic tight-binding basis to capture multi-electron exchange and correlation effects taking into account the full bandstructure of silicon and the atomic scale granularity of a nanoscale device. Excited s-like states of A1-symmetry are found to strongly influence the charging energy of a negative donor centre. We apply the technique on sub-surface dopants subjected to gate electric fields, and show that bound triplet states appear in the spectrum as a result of decreased charging energy. The exchange energy, obtained for the two-electron states in various confinement regimes, may enable engineering electrical control of spins in donor-dot hybrid qubits.
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