The work presents a comparative study on the effects of In incorporation in the channel layer of AlGaN/GaN type-II heterostructures grown on c-plane sapphire by Plasma Assisted Molecular Beam Epitaxy. The structural characterizations of these samples were performed by High-Resolution X-Ray Diffraction (HRXRD), X-ray Reflectivity (XRR), Field Emission Scanning Electron Microscopy, and High Resolution Transmission Electron Microscopy. The two-dimensional electron gas in the AlGaN/GaN and AlGaN/InGaN interface was analyzed by electrochemical capacitance voltage and compared with theoretical results based on self-consistent solution of Schördinger–Poisson equations. The carrier profile shows enhanced confinement in InGaN channel (1.4393 × 1013 cm−2 compared to 1.096 × 1013 cm−2 in GaN). On the basis of HRXRD measurements, the stress-strain of the layers was examined. The c- and a-lattice parameters of the epilayers as well as in-plane and out-of plane strains were determined from the ω-2θ for symmetric scan and ω-Xθ (X represents the coupling coefficient) for asymmetric scan. Strain, tilt, and correlation lengths were calculated from Williamson–Hall plots, whereas stress was examined from modified plot of the same data assuming Uniform Stress Deformation Model. Moreover, the twist angle was measured from skew symmetric scan of (102), (103), and (105) plane along with (002) symmetric plane. The composition and strain/relaxation state of the epilayers were observed in detail by reciprocal space mapping (RSM). The symmetric (002) triple axis RSM and asymmetric (105 and 114) double axis RSM of grazing incidence and exit geometry were carried out on each sample. The defect density was measured from HRXRD curves of skew symmetric (002) and (102) reflection plane. The Al and In mole fraction and strain states of the layers were calculated by fitting the experimental curves with computer simulations and compared with theoretical findings based on elastic theory. The thicknesses of the layers and roughness of the interfaces were measured from simulation of the nominal structure by fitting with XRR experimental curves. The HRXRD measured thicknesses of the layers were further confirmed by cross sectional electron micrographs.
Earth abundant CZTS (Cu2ZnSnS4) absorber layers are promising for the development of cost-effective and large area photovoltaics; however, interfacial nonradiative recombination is a major obstruction to the pathways toward high performing CZTS devices. Elimination of interfacial recombination losses via interface engineering is paramount to obtain efficient CZTS solar cells. Herein, we report a systematic investigation of the influence of oxygen vacancies (OV) settled at the CZTS/TiO2 interface on the charge transfer rate in heterostructures. Modulation of OV by varying oxygen flow rate during TiO2 deposition was confirmed by x-ray photoelectron spectroscopy. Lower OV concentration shifted the conduction band offset from negative to positive at the CZTS/TiO2 heterojunction, which is essential for efficient charge transportation through the interface. Photoluminescence quenching of the CZTS/TiO2 heterojunction also showed a strong correlation between charge dynamics and OV at the interface. Finally, we found the fast decay response of photogenerated charge carriers for the CZTS/TiO2 device with lower OV strongly favors the suppression of carrier trapping at the interface. This work provides a critical insight into interface engineering in CZTS solar cells through regulating interfacial OV, particularly when an oxide electron transport layer is applied.
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