The electronic structure of GaN(1-100) surfaces is investigated in-situ by photoelectron spectroscopy (PES) and reflection anisotropy spectroscopy (RAS). Occupied surface states 3.1 eV below the Fermi energy are observed by PES, accompanied by surface optical transitions found in RAS around 3.3 eV, i.e., below the bulk band gap. These results indicate that the GaN(1-100) surface band gap is smaller than the bulk one due to the existence of intra-gap states, in agreement with density functional theory calculations. Furthermore, the experiments demonstrate that RAS can be applied for optical surface studies of anisotropic crystals. V C 2014 AIP Publishing LLC.
In this work, a wet-chemical synthesis method for gold-silver core-shell particles with nanometer precise adjustable silver shell thicknesses is presented. Typically wet-chemical syntheses lead to relatively large diameter size distributions and losses in the yield of the desired particle structure due to thermodynamical effects. With the here explained synthesis method in micro fluidic segment sequences, a combinatorial in situ parameter screening of the reactant concentration ratios by programmed flow rate shifts in conjunction with efficient segment internal mixing conditions is possible. The highly increased mixing rates ensure a homogeneous shell deposition on all presented gold core particles while the amount of available silver ions was adjusted by automated flow rate courses, from which the synthesis conditions for exactly tunable shell thicknesses between 1.1 and 6.1 nm could be derived. The findings according to the homogeneity of size and particle structure were confirmed by differential centrifugal sedimentation (DCS), scanning and transmission electron microscopy (SEM, TEM) and X-ray photoelectron spectroscopy (XPS) measurements. In UV-Vis measurements, a significant contribution of the core metal was found in the shape of the extinction spectra in the case of thin shells. These results were confirmed by theoretical calculations.
Valence band structure and surface states of InN with (0001), (000-1), (1-100), and (11-20) orientation were investigated in situ after growth using photoelectron spectroscopy. Depending on surface orientation, different occupied surface states are identified and differentiated from bulk contributions. For N-polar, m-plane, and a-plane InN, the surface states are located at the valence band maximum, while In-polar InN features surface states close to the Fermi level. The surface band alignment correlates with the position of surface states. For InN(0001), a much larger surface downward band bending is observed compared to N-polar, m-plane, and a-plane InN, where almost flat band conditions occur.
The surface electronic properties and adsorption behaviour of as‐grown and oxidized N‐polar InN films are characterized by photoelectron spectroscopy (XPS, UPS). The epitaxial growth of the InN layers was performed by plasma‐assisted molecular beam epitaxy on GaN/6H‐SiC(000‐1). After growth and in situ characterization the InN surfaces were exposed to molecular oxygen to evaluate the adsorption behaviour of O2 on N‐polar InN and to study its impact on the surface electronic properties of the III‐nitride material. The results are compared with studies on In‐polar InN on GaN/sapphire templates. The as‐grown N‐polar InN surface exhibits a pronounced surface state at a binding energy of ∼1.6 eV. The valence band minimum lies about 0.8–1.0 eV below the surface Fermi level. Additionally, the XPS core level binding energies for InN(000‐1) are reduced compared to InN(0001) films, indicating different surface band bending for clean N‐polar and In‐polar InN, respectively. The interaction of molecular oxygen with the InN(000‐1) surface leads to a downward band bending by 0.1 eV compared to the initial state. Additional adsorption of species from the residual gas of the UHV chamber increases the surface downward band bending. Furthermore two pronounced oxygen related states with an energy distance of ∼5 eV could be detected in the valence band region. The adsorbed oxygen results in an additional component in the N1s core level spectra, which is interpreted as formation of NOx bonds.
We investigated the surface chemistry and valence band (VB) structure of as-grown thin InN(0001)-2 Â 2 films as well as their change upon the exposure to oxygen and water. The InN films were grown by plasma-assisted molecular beam epitaxy (PAMBE) and in situ characterized by reflection high electron energy diffraction (RHEED) and photoelectron spectroscopy (UPS, XPS). The oxygen and water exposure was directly performed on the as-grown, contamination-free InN surfaces at room temperature and leads to changes in the chemical surface states as well as the electronic properties. For 2 Â 2 reconstructed InN surfaces one observes directly after growth a surface state at the Fermi-edge which decreases continuously with oxygen and water exposure. Furthermore, two oxygen related electronic states develop in the VB at binding energies at around 5 and 10 eV. For water exposure a third weak state around 8 eV is additionally observed. The impact of oxygen and water on the work function F as well as the variation of surface band bending was investigated. In both cases for initially 2 Â 2 reconstructed surfaces a reduction in the downward band bending is found, while F increases in the case of oxygen exposure but in the case of interaction with water a reduced work function is observed. The oxygen uptake rates reveal a higher reactivity of water with InN surfaces compared to oxygen. Furthermore, during oxidation and water exposure different chemical oxygen bonds are formed, but a direct assignment to In-O or N-O bonds is difficult due to changes in the In3d and N1s XPS core level peak shape.
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