The efficient harvesting of electromagnetic (EM) waves by subwavelength nanostructures can result in perfect light absorption in the narrow or broad frequency range. These metamaterial-based perfect light absorbers are of particular interest in many applications, including thermal photovoltaics, photovoltaics, sensing, filtering, and photodetection applications. Although advances in nanofabrication have provided the opportunity to observe strong light−matter interaction in various optical nanostructures, the repeatability and upscaling of these nano units have remained a challenge for their use in large scale applications. Thus, in recent years, the concept of lithography-free planar light perfect absorbers has attracted much attention in different parts of the EM spectrum, owing to their ease of fabrication and high functionality. This Perspective explores the material and architecture requirements for the realization of light perfect absorption using these multilayer metamaterial designs from ultraviolet (UV) to far-infrared (FIR) wavelength regimes. We provide a general theoretical formulation to find the ideal condition for achieving near unity light absorption. Later, these theoretical estimations are coupled with findings of recent studies on perfect light absorbers to explore the physical phenomena and the limits of different materials and design architectures. These studies are categorized in three main class of materials; metals, semiconductors, and other types of materials. We show that, by the use of proper material and design configuration, it is possible to realize these lithography-free light perfect absorbers in every portion of the EM spectrum. This, in turn, opens up the opportunity of the practical application of these perfect absorbers in large scale dimensions. In the last section, we discuss the progress, challenges, and outlook of this field to outline its future direction.

Nanostructured hybrid heterojunctions have been studied widely for photocatalytic applications due to their superior optical and structural properties. In this work, the impact of angstrom thick atomic layer deposited (ALD) ZnO shell layer on photocatalytic activity (PCA) of hydrothermal grown single crystalline TiO2 nanowires (NWs) is systematically explored. We showed that a single cycle of ALD ZnO layer wrapped around TiO2 NWs, considerably boosts the PCA of the heterostructure. Subsequent cycles, however, gradually hinder the photocatalytic activity (PCA) of the TiO2 NWs. Various structural, optical, and transient characterizations are employed to scrutinize this unprecedented change. We show that a single atomic layer of ZnO shell not only increases light harvesting capability of the heterostructure via extension of the absorption toward visible wavelengths, but also mitigates recombination probability of carriers through reduction of surface defects density and introduction of proper charge separation along the core-shell interface. Furthermore, the ultrathin ZnO shell layer allows a strong contribution of the core (TiO2) valence band holes through tunneling across the ultrathin interface. All mechanisms responsible for this enhanced PCA of heterostructure are elucidated and corresponding models are proposed.

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In this paper, we propose a methodology to maximize the absorption bandwidth of a metal-insulator-metal (MIM) based absorber. The proposed structure is made of a Cr-Al 2 O 3-Cr multilayer design. At the initial step, the optimum MIM planar design is fabricated and optically characterized. The results show absorption above 0.9 from 400 nm to 850 nm. Afterward, the transfer matrix method is used to find the optimal condition for the perfect light absorption in an ultra-broadband frequency range. This modeling approach predicts that changing the filling fraction of the top Cr layer can extend light absorption toward longer wavelengths. We experimentally proved that the use of proper top Cr thickness and annealing temperature leads to a nearly perfect light absorption from 400 nm to 1150 nm, which is much broader than that of a planar design. Therefore, while keeping the overall process lithography-free, the absorption functionality of the design can be significantly improved. The results presented here can serve as a beacon for future performance-enhanced multilayer designs where a simple fabrication step can boost the overall device response without changing its overall thickness and fabrication simplicity.

Abstract:In this work, we propose an optimum unit cell arrangement to obtain near absolute polarization insensitivity in a metal-insulator-metal (MIM) based ultra-broadband perfect absorber. Our findings prove that upon utilizing this optimum arrangement, the response of the absorber is retained and unchanged over all arbitrary incidence light polarizations, regardless of the shape of the top metal patch. First, the impact of the geometry of the top nanopatch resonators on the absorption bandwidth of the overall structure is explored. Then, the response of the MIM design for different incidence polarizations and angles is scrutinized. Finally, the proposed design is fabricated and characterized.