Many current designs contain a large number of standard cells intermixed with larger macro blocks. The range of size in these "mixed block" designs complicates the placement process considerably; traditional methods produce results that are far from satisfactory.In this paper we extend the traditional recursive bisection standard cell placement tool Feng Shui to directly consider mixed block designs. On a set of recent benchmarks, the new version obtains placements with wire lengths substantially lower than other current tools. Compared to Feng Shui 2.4, the placements of a Capo-based approach have 29% higher wire lengths, while the placements of mPG are 26% higher. Run times of our tool are also lower, and the general approach is scalable.
In this paper, we present improvements to recursive bisection based placement. In contrast to prior work, our horizontal cut lines are not restricted to row boundaries; this avoids a "narrow region" problem. To support these new cut line positions, a dynamic programming based legalization algorithm has been developed. The combination of these has improved the stability and lowered the wire lengths produced by our Feng Shui placement tool.On benchmarks derived from industry partitioning examples, our results are close to those of the annealing based tool Dragon, while taking only a fraction of the run time. On synthetic benchmarks, our wire lengths are nearly 23% better than those of Dragon. For both benchmark suites, our results are substantially better than those of the recursive bisection based tool Capo and the analytic placement tool Kraftwerk.
Many current integrated circuits designs, such as those released for the ISPD2005[14] placement contest, are extremely large and can contain a great deal of white space. These new placement problems are challenging; analytic placers perform well, but can suffer from high run times. In this paper, we present a new placement tool called Vaastu. Our approach combines continuous and discrete optimization techniques. We utilize network flows, which incorporate the more realistic halfperimeter wire length objective, to facilitate module spreading in conjunction with a log-sum-exponential function based analytic approach. Our approach obtains wire length results that are competitive with the best known results, but with much lower run times.
Abstract-Circuit placement has a large impact on all aspects of performance; speed, power consumption, reliability, and cost are all affected by the physical locations of interconnected transistors. The placement problem is NP-Complete for even simple metrics.In this paper, we apply techniques developed by the Operations Research (OR) community to the placement problem. Using an Integer Programming (IP) formulation and by applying a "branch-and-price" approach, we are able to optimally solve placement problems that are an order of magnitude larger than those addressed by traditional methods. Our results show that suboptimality is rampant on the small scale, and that there is merit in increasing the size of optimization windows used in detail placement.
In dense integrated circuit designs, management of routing congestion is essential; an over congested design may be unroutable. Many factors influence congestion: placement, routing, and routing architecture all contribute. Previous work has shown that different placement tools can have substantially different demands for each routing layer; our objective is to develop methods that allow "tuning" of interconnect topologies to match routing resources.We focus on congestion minimization for both Manhattan and non-Manhattan routing architectures, and have two main contributions. First, we combine prior heuristics for non-Manhattan Steiner trees and Preferred Direction Steiner trees into a hybrid approach that can handle arbitrary routing directions, via minimization, and layer assignment of edges simultaneously. Second, we present an effective method to adjust Steiner tree topologies to match routing demand to resource, resulting in lower congestion and better routability.
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