Low resistivity Ga-doped ZnO films were prepared on a glass substrate by ion plating with direct current arc discharge. Thickness dependent changes in the electrical properties of the films are reported, focusing on the thin films of less than 100 nm thickness. Structural analyses showed that the thinnest film of 30 nm thickness consists of well-oriented columnar grains normal to the substrate, and the resistivity was as low as 4.4ϫ 10 −4 ⍀ cm. The changes in lattice strain and c-axis fluctuation with the growth of grains are also shown to be associated with the electrical properties.
A p-type ZnO layer was fabricated by excimer laser doping technique using thermally oxidized ZnO films. Epitaxial ZnO(0001) films were formed by thermal oxidation of epitaxial ZnSe films on Si(111) substrate grown by remote plasma enhanced metal-organic chemical vapor deposition. The p-type ZnO was fabricated by excimer laser irradiation with Sb as a dopant source. A good Ohmic contact was obtained between Sb doped ZnO layer and gold metal electrodes. The Sb doped ZnO layer showed positive Hall coefficient, the resistivity was 8 Â 10 --3 W cm with a hole mobility of 1.5 cm 2 /Vs and an acceptor concentration of 5 Â 10 20 cm --3 as p-type, respectively.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.