Silicon is more than the dominant material in the conventional microelectronics industry: it also has potential as a host material for emerging quantum information technologies. Standard fabrication techniques already allow the isolation of single electron spins in silicon transistor-like devices. Although this is also possible in other materials, silicon-based systems have the advantage of interacting more weakly with nuclear spins. Reducing such interactions is important for the control of spin quantum bits because nuclear fluctuations limit quantum phase coherence, as seen in recent experiments in GaAs-based quantum dots. Advances in reducing nuclear decoherence effects by means of complex control still result in coherence times much shorter than those seen in experiments on large ensembles of impurity-bound electrons in bulk silicon crystals. Here we report coherent control of electron spins in two coupled quantum dots in an undoped Si/SiGe heterostructure and show that this system has a nuclei-induced dephasing time of 360 nanoseconds, which is an increase by nearly two orders of magnitude over similar measurements in GaAs-based quantum dots. The degree of phase coherence observed, combined with fast, gated electrical initialization, read-out and control, should motivate future development of silicon-based quantum information processors.

We demonstrate improved operation of exchange-coupled semiconductor quantum dots by substantially reducing the sensitivity of exchange operations to charge noise. The method involves biasing a double dot symmetrically between the charge-state anticrossings, where the derivative of the exchange energy with respect to gate voltages is minimized. Exchange remains highly tunable by adjusting the tunnel coupling. We find that this method reduces the dephasing effect of charge noise by more than a factor of 5 in comparison to operation near a charge-state anticrossing, increasing the number of observable exchange oscillations in our qubit by a similar factor. Performance also improves with exchange rate, favoring fast quantum operations. DOI: 10.1103/PhysRevLett.116.110402 Gated semiconductor quantum dots are a leading candidate for quantum information processing due to their high speed, density, and compatibility with mature fabrication technologies [1,2]. Quantum dots are formed by spatially confining individual electrons using a combination of material interfaces and nanoscale metallic gates. Although several quantized degrees of freedom are available [3][4][5], the electron spin is often employed as a qubit due to its long coherence time [6,7]. Spin-spin coupling may be controlled via the kinetic exchange interaction, which has the benefit of short range and electrical controllability. Numerous qubit proposals use exchange, including as a two-qubit gate between ESR-addressed spins [8], a single axis of control in a two dot system also employing gradient magnetic fields [9] or spin-orbit couplings [10], or as a means of full qubit control on a restricted subspace of at least three coupled spins [11][12][13]. However, since exchange relies on electron motion, it is susceptible to electric field fluctuations, or charge noise. Limiting the consequence of this noise is critical to attaining performance of exchange-based qubits adequate for quantum information processing.Charge noise in semiconductor quantum dots may originate from a variety of sources including electric defects at interfaces and in dielectrics [14]. These defects typically result in electric fields that exhibit an approximate 1=f noise spectral density. Conventional routes for reducing charge noise include improving materials and interfaces [15] and dynamical decoupling [16][17][18][19]. In this Letter, rather than addressing the microscopic origins or detailed spectrum of charge noise, we introduce a "symmetric" mode of operation where the exchange interaction is less susceptible to that noise. This is done by biasing the device to a regime where the strength of the exchange interaction is first-order insensitive to dot chemical potential fluctuations but is still controllable by modulating the interdot tunnel barrier. This dramatically reduces the effects of charge noise.The principle of symmetric operation can be understood by treating charge noise as equivalent to voltage fluctuations on confinement gates. This approximation is valid when materi...

Three coupled quantum dots in isotopically purified silicon enable all-electrical qubit control with long coherence time.

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We demonstrate double quantum dots fabricated in undoped Si/SiGe heterostructures relying on a double top-gated design. Charge sensing shows that we can reliably deplete these devices to zero charge occupancy. Measurements and simulations confirm that the energetics are determined by the gate-induced electrostatic potentials. Pauli spin blockade has been observed via transport through the double dot in the two electron configuration, a critical step in performing coherent spin manipulations in Si.Comment: 4 pages, 4 figure

We have demonstrated few-electron quantum dots in Si/SiGe and InGaAs, with occupation number controllable from N = 0. These display a high degree of spatial symmetry and identifiable shell structure. Magnetospectroscopy measurements show that two Si-based devices possess a singlet N =2 ground state at low magnetic field and therefore the two-fold valley degeneracy is lifted. The valley splittings in these two devices were 120 and 270 {\mu}eV, suggesting the presence of atomically sharp interfaces in our heterostructures.Comment: 3 pages, 3 figure

We report on an experimental demonstration of graphene-metal ohmic contacts with contact resistance below 100 Ω µm. These have been fabricated on graphene wafers, both with and without hydrogen intercalation, and measured using the transmission line method. Specific contact resistivities of 3 × 10−7 to 1.2 × 10−8 Ω cm2 have been obtained. The ultra-low contact resistance yielded short-channel (source-drain distance of 0.45 µm) HfO2/graphene field effect transistors (FETs) with a low on-resistance (Ron) of 550 Ω µm and a high current density of 1.7 A/mm at a source-drain voltage of 1 V. These values represent state-of-the-art (SOA) performance in graphene-metal contacts and graphene FETs. This ohmic contact resistance is comparable to that of SOA high-speed III–V high electron mobility transistors.

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