The emerging field of plasmonics has yielded methods for guiding and localizing light at the nanoscale, well below the scale of the wavelength of light in free space. Now plasmonics researchers are turning their attention to photovoltaics, where design approaches based on plasmonics can be used to improve absorption in photovoltaic devices, permitting a considerable reduction in the physical thickness of solar photovoltaic absorber layers, and yielding new options for solar-cell design. In this review, we survey recent advances at the intersection of plasmonics and photovoltaics and offer an outlook on the future of solar cells based on these principles.

Recent developments in photovoltaic materials have led to continual improvements in their efficiency. We review the electrical characteristics of 16 widely studied geometries of photovoltaic materials with efficiencies of 10 to 29%. Comparison of these characteristics to the fundamental limits based on the Shockley-Queisser detailed-balance model provides a basis for identifying the key limiting factors, related to efficient light management and charge carrier collection, for these materials. Prospects for practical application and large-area fabrication are discussed for each material.

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The scattering from metal nanoparticles near their localized plasmon resonance is a promising way of increasing the light absorption in thin-film solar cells. Enhancements in photocurrent have been observed for a wide range of semiconductors and solar cell configurations. We review experimental and theoretical progress that has been made in recent years, describe the basic mechanisms at work, and provide an outlook on future prospects in this area.

We present a numerical analysis of surface plasmon waveguides exhibiting both long-range propagation and spatial confinement of light with lateral dimensions of less than 10% of the free-space wavelength. Attention is given to characterizing the dispersion relations, wavelength-dependent propagation, and energy density decay in two-dimensional Ag/ SiO 2 / Ag structures with waveguide thicknesses ranging from 12 nm to 250 nm. As in conventional planar insulator-metal-insulator ͑IMI͒ surface plasmon waveguides, analytic dispersion results indicate a splitting of plasmon modes-corresponding to symmetric and antisymmetric electric field distributions-as SiO 2 core thickness is decreased below 100 nm. However, unlike IMI structures, surface plasmon momentum of the symmetric mode does not always exceed photon momentum, with thicker films ͑d ϳ 50 nm͒ achieving effective indices as low as n = 0.15. In addition, antisymmetric mode dispersion exhibits a cutoff for films thinner than d = 20 nm, terminating at least 0.25 eV below resonance. From visible to near infrared wavelengths, plasmon propagation exceeds tens of microns with fields confined to within 20 nm of the structure. As the SiO 2 core thickness is increased, propagation distances also increase with localization remaining constant. Conventional waveguiding modes of the structure are not observed until the core thickness approaches 100 nm. At such thicknesses, both transverse magnetic and transverse electric modes can be observed. Interestingly, for nonpropagating modes ͑i.e., modes where propagation does not exceed the micron scale͒, considerable field enhancement in the waveguide core is observed, rivaling the intensities reported in resonantly excited metallic nanoparticle waveguides.