We calculate the electric conductivity and the temperature coefficient of resistance (TCR) of a multilayered film consisting of the alternating polycrystalline metal layers of different thickness and purity within the relaxation time formalism. In the case of Cr, Cu and Co-based multilayered films we perform verification of our analytical formulas and demonstrate a qualitative agreement between the theoretically calculated values of the TCR and experiment.
In this work it is experimentally investigated a size effect in temperature coefficient of resistance (ТCR) of Ni films with Cu and SiO 2 thin overlayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries.
A series of thin-film nanocomposites based on ferromagnetic metal Co and insulator SiO were prepared using an electron-beam method. The magnetoresistive and magnetic properties of these structures deposited at room temperature and then annealed to 700 K were investigated. The results showed that at the Co concentration 40 [Formula: see text]x [Formula: see text] 60 at.%, thin-film nanocomposites exhibit magnetoresistance (MR) that is conditional on spin-dependent tunnelling of electrons. This range of concentrations corresponds to the prepercolation area according to the magnetic investigations. For samples with x [Formula: see text] 70 at.%, the anisotropic character of MR peculiar to the homogeneous ferromagnetic materials appears. According to the magnetic properties study, this range of concentrations corresponds to the area after transition through the percolation threshold. The annealing process in temperature range from 300 K to 700 K in the magnetic field slightly influenced the magnetoresistive properties of the thin-film nanocomposites based on Co and SiO for all range of concentrations.
Phase composition of the double-layer Ni-base and V-base films obtained and annealed in vacuum of 10 -4
−10-5 Pa within the temperature range of 700−900 K is studied by technique of electronography and transmission electron microscopy. Temperature dependence of resistance and temperature coefficient of resistance (TCR) was investigated. Comparison of TCR experimental data with the calculated data was made at Т=300 К on basis of semiclassical and macroscopic models and formula for TCR of alloys.
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