In this study, thin films of aluminium nitride (AlN) are deposited on Nimonic 75 substrates using a 4 kJ Mather type plasma focus device (PFD) for 5, 10 and 15 focus shots. For the deposition of AlN films, a solid aluminium fitted anode was used instead of a copper anode. The PFD was operated with nitrogen gas at a pressure of 2 torr. X-ray diffraction results reveal the formation of a nanocrystalline AlN coating on the surface of the substrate. The crystallite size is dependent on the number of focus shots. The density of grains increased with an increase in the number of focus deposition shots, as illustrated by field emission scanning electron microscopy (FESEM). The FESEM images confirm the distribution of spherical grains for 15 focus shots. Energy dispersive X-ray spectroscopy spectra indicate the presence of expected constituent elements such as N and Al.
In this paper, the deposition of Ni-Al-N coatings on Nimonic 75 substrates using a 4 kJ plasma focus device for 30 shots is investigated. The results obtained by field emission scanning electron microscopy and X-ray diffraction (XRD) tests confirm the formation of Ni-Al-N nanoparticles on the surface of the samples with an average crystalline size of ,20-50 nm. The hot corrosion rate was determined by measuring the weight gain of the samples at 8008C. Improvement of charge transfer resistance by electrochemical impedance spectroscopy reveals that the coated layer can significantly increase resistance to corrosion.
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