Investigation of Nimonic Alloy: Plasma Interaction in Different Plasma Pulses Using a Small Plasma Focus Device

Habibi, M.; Laktarashi, A.

doi:10.1007/s10894-016-0060-7

Cited by 4 publications

(2 citation statements)

References 26 publications

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“…Progress in such research has stimulated ion-beam emission studies in areas of material science, the ion-beam source motivating research applications in for instance surface modification [ 32 , 33 ], ion implantation [ 34 , 35 ], thin-film deposition [ 36 , 37 ], semiconductor doping [ 38 ], synthesis of nanoparticles [ 39 ], amorphization of silicon [ 40 ], Nanostructuring of FePt thin films [ 41 ] and formation of nanoparticle [ 42 ]. While many ion-beam measurement and diagnostic techniques have been developed, most particularly in seeking to characterize ion-beam emission, challenges continue to remain in clarifying the various emission complexities.…”

Section: Introductionmentioning

confidence: 99%

Time-resolved characteristics of deuteron-beam generated by plasma focus discharge

2018

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The plasma focus device discussed herein is a Z-pinch pulsed-plasma arrangement. In this, the plasma is heated and compressed into a cylindrical column, producing a typical density of > 1025 particles/m3 and a temperature of (1–3) × 107 oC. The plasma focus has been widely investigated as a radiation source, including as ion-beams, electron-beams and as a source of x-ray and neutron production, providing considerable scope for use in a variety of technological situations. Thus said, the nature of the radiation emission depends on the dynamics of the plasma pinch. In this study of the characteristics of deuteron-beam emission, in terms of energy, fluence and angular distribution were analyzed. The 2.7 kJ plasma focus discharge has been made to operate at a pressure of less than 1 mbar rather than at its more conventional operating pressure of a few mbar. Faraday cup were used to determine deuteron-beam energy and deuteron-beam fluence per shot while CR-39 solid-state nuclear track detectors were employed in studying the angular distribution of deuteron emission. Beam energy and deuteron-beam fluence per shot have been found to be pressure dependent. The largest value of average deuteron energy measured for present conditions was found to be (52 ± 7) keV, while the deuteron-beam fluence per shot was of the order of 1015 ions/m2 when operated at a pressure of 0.2 mbar. The deuteron-beam emission is in the forward direction and is observed to be highly anisotropic.

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Section: Introductionmentioning

confidence: 99%

Time-resolved characteristics of deuteron-beam generated by plasma focus discharge

2018

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“…In the X‐ray diffraction (XRD) pattern of the surface of p‐AlGaN after the PEBD process (Figure b), a new diffraction peak is observed at 2 θ = 91.34°, not observed in the XRD pattern of p‐AlGaN before the PEBD process. The new peak is assigned to the (0004) facet of Ni 3 N, suggesting that a new structure of Ni 3 N is formed between Ni:AlN and p‐AlGaN. This is an important clue for the understanding of the Ohmic contact between the Ni:AlN and p‐AlGaN layers.…”

Section: Resultsmentioning

confidence: 82%

Smart Wide‐Bandgap Omnidirectional Reflector as an Effective Hole‐Injection Electrode for Deep‐UV Light‐Emitting Diodes

Lee

Park

Shin

et al. 2019

Advanced Optical Materials

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Deep‐ultraviolet light‐emitting diodes (DUV‐LEDs) find widespread applications in various industries and are a focus area in environmental and life science research. However, the quantum efficiency of DUV‐LEDs is still low because of the unbalanced hole injection, high operation voltage, and low reflectivity of the p‐electrode. In this study, a smart wide‐bandgap omnidirectional reflector (ODR), which simultaneously acts as an effective hole‐injection electrode, is demonstrated for a flip‐chip DUV‐LED. The smart ODR is composed of p‐type AlGaN (p‐AlGaN)/Ni:AlN/Al with a high reflectivity of 94.2% at 280 nm, in which AlN with a theoretically calculated thickness of 40 nm is Ni‐doped using the pulsed electrical breakdown (PEBD) method. The smart ODR‐mounted AlGaN‐multiquantum‐well‐based DUV‐LED exhibits a remarkable wall‐plug efficiency (4.8%) and high external quantum efficiency (8.5%) at a low operation voltage of 9.75 V owing to the fused layer of Ni3N and Ga vacancies formed in the interfacial region of the p‐AlGaN and AlN layers, through the mutual diffusion of Ni and Ga during PEBD. The interface‐mediated Ohmic contact leads to an effective hole injection without reducing the reflectivity, yielding increased optical output and electric input powers. The proposed smart ODR can provide an innovative route for the manipulation of DUV light.

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A Short Review on the Processing of Nimonic Superalloys by Powder Metallurgy Route

Mahanta,

Sahu,

Dalai

et al. 2024

Lecture Notes in Mechanical Engineering

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Investigation of Nimonic Alloy: Plasma Interaction in Different Plasma Pulses Using a Small Plasma Focus Device

Cited by 4 publications

References 26 publications

Time-resolved characteristics of deuteron-beam generated by plasma focus discharge

Time-resolved characteristics of deuteron-beam generated by plasma focus discharge

Smart Wide‐Bandgap Omnidirectional Reflector as an Effective Hole‐Injection Electrode for Deep‐UV Light‐Emitting Diodes

A Short Review on the Processing of Nimonic Superalloys by Powder Metallurgy Route

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