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The development of anodic films at a constant current density of 10 mA cm−2 has been studied for Mg-W alloys, containing 0.4 and 1.0 atom % W, in 3 M ammonium hydroxide/0.05 M ammonium phosphate electrolyte at 293 K. The structure, morphology, and composition of the films were determined by X-ray diffraction, scanning electron microscopy, atomic force microscopy, glow discharge optical emission spectroscopy, Rutherford backscattering spectroscopy, and nuclear reaction analysis. During anodizing to about 50 V, a relatively smooth film develops. Cross-sectional atomic force microscopy suggests the film may be finely porous. With an increase in voltage, the film transforms gradually to a coarse, porous morphology due to dielectric breakdown. The transformation coincides with a reduction in slope of the voltage-time response. Significant regions of both types of film morphology coexist during anodizing to 150 V. With further anodizing, a porous film, developed in the presence of sparking above about 270 V, eventually covers all of the macroscopic surface. Magnesium, phosphorus, oxygen, hydrogen, and nitrogen species are present throughout the film thickness at the resolution of the measurements. However, the films are initially free of tungsten species due to enrichment of tungsten in the alloy. The O:Mg atomic ratio is in the range 1.7 to 2.1, reducing with an increase in voltage for films formed up to 220 V, consistent with films composed primarily of hydroxide or oxyhydroxide. The P:O atomic ratio increases with an increase in voltage, starting at about 0.03 for voltages below 50 V and reaching 0.29 at 330 V. The films form at a reduced efficiency, typically about 40-50%. © 2001 The Electrochemical Society. All rights reserved.

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