Wissenschaftliche Veröffentlichungen Aus Den Siemens-Werken 1939
DOI: 10.1007/978-3-642-99673-3_17
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Zur quantitativen Durchführung der Raumladungs- und Randschichttheorie der Kristallgleichrichter

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Cited by 55 publications
(12 citation statements)
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“…Schottky barrier diodes have been under practical consideration since the early 1930s and the transport mechanisms that determine the J-V re lations have been the object of much theoretical research (Wagner, 1931;Schottky and Spenke, 1939;Sze, 1969), which has been reviewed by Rhoderick (1974) and Padovani (1971). The forward-bias transport mecha nisms (for n-type semiconductors, for example) include (a) thermionic emission of electrons from the semiconductor over the top of the barrier into the metal, (b) recombination in the depletion region, (c) quantum mechanical tunneling through the barrier, and (d) hole (minority carrier) injection and diffusion.…”
Section: Basic Schottky Barriersmentioning
confidence: 99%
“…Schottky barrier diodes have been under practical consideration since the early 1930s and the transport mechanisms that determine the J-V re lations have been the object of much theoretical research (Wagner, 1931;Schottky and Spenke, 1939;Sze, 1969), which has been reviewed by Rhoderick (1974) and Padovani (1971). The forward-bias transport mecha nisms (for n-type semiconductors, for example) include (a) thermionic emission of electrons from the semiconductor over the top of the barrier into the metal, (b) recombination in the depletion region, (c) quantum mechanical tunneling through the barrier, and (d) hole (minority carrier) injection and diffusion.…”
Section: Basic Schottky Barriersmentioning
confidence: 99%
“…7, a t low current levels the experimental points deviate from the dependence predicted by the thermionic emission theory. An alternative description of I-U characteristics is the diffusion-limited approximation developed by Schottky and Spenke [18].…”
Section: Resultsmentioning
confidence: 99%
“…techniques. [14][15][16][17][18][24][25][26][27] However, the microscopic origins of this defect are not clear as yet. Annealing ZnO samples in different ambient increases the intensity of the DLTS peak for the E3 defect (Figure 3(a)), with the highest intensity being observed for the Ar þ O 2 annealed samples.…”
Section: Emission Properties Of E3mentioning
confidence: 99%