ZnO thin film synthesis by reactive radio frequency magnetron sputtering

Şenay, Volkan; Pat, Şuat; Korkmaz, Şadan; Aydoğmuş, Tuna; Elmas, Saliha; Özen, Soner; Ekem, N.; Balbağ, M. Zafer

doi:10.1016/j.apsusc.2013.10.044

Cited by 50 publications

(13 citation statements)

References 29 publications

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“…The recent research report findings indicate that the high quality ZnO thin film could be synthesized by various techniques such as sol-gel method, radio frequency magnetron sputtering, metal organic chemical vapor deposition (MOCVD), and so on [9][10][11][12][13][14] . Each technique has its advantages and disadvantages.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

Chao

Wei

2015

JoVE

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In this study, zinc oxide (ZnO) thin films with high c-axis (0002) preferential orientation have been successfully and effectively synthesized onto silicon (Si) substrates via different synthesized temperatures by using plasma enhanced chemical vapor deposition (PECVD) system. The effects of different synthesized temperatures on the crystal structure, surface morphologies and optical properties have been investigated. The X-ray diffraction (XRD) patterns indicated that the intensity of (0002) diffraction peak became stronger with increasing synthesized temperature until 400 (o)C. The diffraction intensity of (0002) peak gradually became weaker accompanying with appearance of (10-10) diffraction peak as the synthesized temperature up to excess of 400 (o)C. The RT photoluminescence (PL) spectra exhibited a strong near-band-edge (NBE) emission observed at around 375 nm and a negligible deep-level (DL) emission located at around 575 nm under high c-axis ZnO thin films. Field emission scanning electron microscopy (FE-SEM) images revealed the homogeneous surface and with small grain size distribution. The ZnO thin films have also been synthesized onto glass substrates under the same parameters for measuring the transmittance. For the purpose of ultraviolet (UV) photodetector application, the interdigitated platinum (Pt) thin film (thickness ~100 nm) fabricated via conventional optical lithography process and radio frequency (RF) magnetron sputtering. In order to reach Ohmic contact, the device was annealed in argon circumstances at 450 (o)C by rapid thermal annealing (RTA) system for 10 min. After the systematic measurements, the current-voltage (I-V) curve of photo and dark current and time-dependent photocurrent response results exhibited a good responsivity and reliability, indicating that the high c-axis ZnO thin film is a suitable sensing layer for UV photodetector application.

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Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

Chao

Wei

2015

JoVE

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“…5,9 The optical bandgaps of the produced TiO 2 films were estimated from the Tauc plot based on the relation ðhÞ 2 ¼ Cðh À E g Þ using optical absorption data obtained by the UV-Vis spectrophotometer. 22,23 Here, is the absorption coefficient, h is the photon energy, C is a constant, and E g is the optical bandgap. Figure 2(c) shows the drawn Tauc plots of the produced TiO 2 films.…”

Section: Resultsmentioning

confidence: 99%

A new method for titania thin film production

Şenay

Özen

Pat

et al. 2015

Journal of Thermoplastic Composite Materials

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In this research, transparent titania (TiO 2 ) thin films were deposited on a glass microscope slide and on a flexible polyethylene terephthalate (PET) substrate under a high vacuum condition by means of the thermionic vacuum arc (TVA) method in a very short period of time (60 s). Optical properties and surface properties of the coated TiO 2 surfaces are related to the structural changes of the coated layers due to ion energies and substrate effect. But obtained results are closely linked to literature values. Our analysis showed that the TVA method is an alternative method for low-temperature coatings and the produced films present important advantages for optical and industrial applications.

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“…Интерес к оксиду цинка (ZnO) обусловлен особой комбинацией оптических, электрических и акустических свойств. Кроме того, он имеет большую энергию связи экситона, ∼ 60 мэВ, и большую ширину запрещенной зоны, 3.36 эВ при комнатной температуре [1]. Благодаря этим свойствам пленки ZnO применяются в солнечных элементах, детекторах ультрафиолетового и инфракрасного излучения, газовых сенсорах и пьезоэлектронных устройствах в качестве преобразователя поверхностно-акустических волн [2][3][4].…”

Section: Introductionunclassified

Влияние температуры фотонного отжига на структурные и оптические свойства пленок ZnO, синтезированных методом дуального магнетронного распыления

Зайцев¹,

Vashchilin²,

Kolesnik³

et al. 2019

Физика И Техника Полупроводников

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Zinc-oxide films 1.4 μm in thickness are deposited onto glassy substrates by the dual magnetron-assisted sputtering of zinc targets in an argon and oxygen gas atmosphere. The dependences of the structural and optical characteristics of the ZnO films on the temperature of postdeposition photonic annealing are studied. It is established that an increase in the annealing temperature yields an increase in the degree of crystallinity of the films. Electron microscopy shows that the deposited ZnO coatings are columnar in structure and the microstructure density and crystallite size increase upon annealing. It is found that, at an annealing temperature of 450–650°C, the optical transmittance increases to >90% in the spectral range 400–1100 nm. The experimental results show that the temperature of vacuum photonic annealing has the most profound effect on the final properties of ZnO coatings.

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ZnO thin film synthesis by reactive radio frequency magnetron sputtering

Cited by 50 publications

References 29 publications

Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

A new method for titania thin film production

Влияние температуры фотонного отжига на структурные и оптические свойства пленок ZnO, синтезированных методом дуального магнетронного распыления

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