Zirconium and niobium transmission data at wavelengths from 11-16 nm and 200-1200 nm

Johnson, Terry A.; Soufli, Régina; Gullikson, Eric M.; Clift, Miles

doi:10.1117/12.564259

Cited by 7 publications

(4 citation statements)

References 6 publications

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“…26 The two-component filter consists of a nitrocellulose pellicle (thickness: 2, 5, or 15 μm) whose inner part has been replaced by a 200 nm thick zirconium or palladium metal filter with a diameter of 5 mm. When the co-propagating XUV and NIR beams are incident on this filter, the central metal component suppresses the NIR by approximately seven orders of magnitude, effectively blocking it, 34,35 while transmitting a significant fraction of the XUV radiation (the transmission is 52% at 100 eV for 200 nm of zirconium and 37% at 135 eV for 200 nm of palladium 36 ). On the other hand, the outer nitrocellulose component allows for nearly full transmission of the NIR (∼92%), while completely blocking the XUV radiation.…”

Section: Beamlinementioning

confidence: 99%

A flexible apparatus for attosecond photoelectron spectroscopy of solids and surfaces

Magerl

Neppl

Cavalieri

et al. 2011

Review of Scientific Instruments

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We describe an apparatus for attosecond photoelectron spectroscopy of solids and surfaces, which combines the generation of isolated attosecond extreme-ultraviolet (XUV) laser pulses by high harmonic generation in gases with time-resolved photoelectron detection and surface science techniques in an ultrahigh vacuum environment. This versatile setup provides isolated attosecond pulses with photon energies of up to 140 eV and few-cycle near infrared pulses for studying ultrafast electron dynamics in a large variety of surfaces and interfaces. The samples can be prepared and characterized on an atomic scale in a dedicated flexible surface science end station. The extensive possibilities offered by this apparatus are demonstrated by applying attosecond XUV pulses with a central photon energy of ∼125 eV in an attosecond streaking experiment of a xenon multilayer grown on a Re(0001) substrate

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Section: Beamlinementioning

confidence: 99%

A flexible apparatus for attosecond photoelectron spectroscopy of solids and surfaces

Magerl

Neppl

Cavalieri

et al. 2011

Review of Scientific Instruments

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“…The intensity of the Zr filtered IP data was 30% of the non-filtered data at 103 mm, which was in accordance with the transmission of Zr filters for 13.5 nm light. 24 In addition, the intensity at 200 mm was 35% of the 103 mm non-filtered IP data. This was proportional to the solid angle for these distances.…”

Section: A Euv Spectra and Imaging Plate Datamentioning

confidence: 99%

“…This is in agreement with previous data. 24 The filter was placed between the target and imaging to ensure that the laser was not blocked but gave the largest angular distribution possible. The angles observed were 10 • to 80 • or 20 • to 90 • at 103 mm target to IP distance, however the angle was reduced slightly due to the bulky frame.…”

Section: -3mentioning

confidence: 99%

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

Musgrave

Takehiro

Ugomori

et al. 2017

Review of Scientific Instruments

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With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

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“…77,78 The spectral purity of EUV plasma sources, and the mitigation of UV and IR have actually become two of the challenges in the development of EUV photo-lithography. 79 A multilayer mirror combined with different filters can be used to improve the spectral purity, [80][81][82] but it usually has a poor EUV transmission and a free-standing filter might be prone to damage. Recently, several new schemes of spectral purity filters (SPF) integrated with multilayer structures have been developed which show a high suppression factor at the unwanted wavelengths at much higher EUV efficiency.…”

Section: High Spectral Purity ML Mirrorsmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Zirconium and niobium transmission data at wavelengths from 11-16 nm and 200-1200 nm

Cited by 7 publications

References 6 publications

A flexible apparatus for attosecond photoelectron spectroscopy of solids and surfaces

A flexible apparatus for attosecond photoelectron spectroscopy of solids and surfaces

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

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