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The Effect of Film Thickness on the Suitability of Titanium Oxynitride (TiNxOy, x + y = 1) Films as Heat Mirrors – Formed by the Atmospheric Pressure CVD of TiCl4 and NH3

“…This value is superior to the results previously found for metal nitride films deposited by CVD, which have included reports of 0.13 for TiN and of 0.12 for VN. [3,5,18,19] A similar merit value has previously been found for TiN, deposited by sputtering, with a value of 0.25. [4] More effective still are layered coatings such as TiO 2 /TiN/TiO 2 (figure of merit = 0.42) [4] and TiO 2 /Ag/TiO 2 (figure of merit = 0.68) [20] also deposited by sputtering.…”

Synthesis of VN nanopowders by thermal nitridation of the precursor and their characterization

“…The conventional procedures for the synthesis of VN, however, are often plagued by high temperature (>1200 • C) and extremely long reaction time (several hours to even days) caused by slow diffusion rates in solids and usually involve many cumbersome steps [14]. Recently, Parkin and Elwin [15] have reported chemical vapor deposition of VN film from reaction of VCl 4 with NH 3 . Yang et al [16] have successfully synthesized nanocrystalline VN by a reduction-nitridation reaction between VCl 4 , NH 4 Cl and Mg. Chen et al [17] have successfully synthesized nanocrystalline VN by the reaction of VCl 4 and NaNH 2 at room temperature.…”

N‐Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t‐Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light

“…Many of these routes have drawbacks in synthetic procedure as well as scale-up into an industrial process due to pre-reaction. [10,11] Furthermore, literature reports about activity are sometimes contradictory. [12] The site of N-doping within the titania is of key importance, and hitherto not fully understood.…”