Yttria-stabilized zirconia films deposited by plasma spraying and sputtering

Fedtke, Petra; Wienecke, M.; Bunescu, Mihaela-C.; Barfels, T.; Deistung, Klaus; Pietrzak, Marlis

doi:10.1007/s10008-003-0485-6

Cited by 16 publications

(7 citation statements)

References 9 publications

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“…These semicircles are associated with the electrode reaction involving in particular oxygen anion transfer at the interfaces between WE, YSZ coating and silicate electrolyte. The impedance values of the studied half-cells with Ni-YSZ-CGO anode, YSZ film and LSAO membrane at 973-1123 K are consistent with literature data on similar anode and film compositions, 18,19,33 although direct comparison is complicated due to temperature difference.…”

Section: Resultssupporting

confidence: 88%

Sputtered YSZ based protective thin films for SOFCs

Shaula

Oliveira

Kolotygin

et al. 2010

Surface Engineering

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Protective Zr(Y)O 22d based films, deposited using magnetron sputtering, onto apatite type ceramics, were appraised for potential applications in solid oxide fuel cells with silicate based solid electrolytes, where performance may suffer from surface decomposition processes in reducing atmospheres. While as prepared Zr(Y)O 22d films without copper additive were already crystallised and single phase, fresh Cu containing Zr(Y)O 22d are essentially amorphous, requiring high temperature treatment in air for crystallisation. Deposition rate of 0?50-0?75 mm h 21 at sputtering power of 300 W was achieved. Surface morphology studies using atomic force microscope revealed typical film structures with small (,50 nm) grains. The hardness of films decreases from 15?8 to 8?4 GPa with increasing copper content. Polarisation studies of electrochemical cell with cermet anodes, applied over protective films, suggested that electrochemical reaction is essentially governed by oxygen anion transfer from zirconia phase and/or hydrogen oxidation in vicinity of zirconia film surface. Copper incorporation into Zr(Y)O 22d film leads to higher anode resistivity.

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Section: Resultssupporting

confidence: 88%

Sputtered YSZ based protective thin films for SOFCs

Shaula

Oliveira

Kolotygin

et al. 2010

Surface Engineering

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“…Similar to RF sputtering, deposition rates are adversely affected by the oxygen partial pressure in the sputtering gas for DC reactive magnetron sputtering of YSZ fi lms. This behavior was shown to be particularly apparent for oxygen partial pressures less than 10 × 10 −4 mbar, as shown in Figure 5.5 [33]. The deposition rate dropped dramatically from ~700 nm h −1 at 7.5 × 10 −4 mbar to ~100 nm h −1 when the oxygen partial pressure was higher than 10 × 10 −4 mbar.…”

Section: Magnetron Sputtering Techniquesmentioning

confidence: 80%

Thin Coating Technologies and Applications in High-Temperature Solid Oxide Fuel Cells

2020

Handbook of Nanostructured Thin Films and Coatings, Three-Volume Set

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A solid oxide fuel cell (SOFC) is an electrochemical device to convert the chemical energy of fuels, such as hydrogen and hydrocarbons, to electricity, with potential applications in transportation, distributed generation, remote power, defense, and many others [1-3]. They offer extremely high chemical-to-electrical conversion effi ciencies because the effi ciency is not limited by the Carnot CONTENTS Cathode Electrolyte Anode Fuel Anode reactions: H 2 + O 2-C n H 2n+2 + (3n+1)O 2-nCO 2 + (n+1)H 2 O + (6n+2)e-CO + O 2-H 2 O + 2e-CO 2 + 2e-O 2 (air) ½ O 2 + 2e-O 2-O = Cathode reaction:

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“…There has been considerable flexibility in the fabrication of YSZ films, and tape-casting [13], dip-coating [14], plasma spraying [15], sol-gel [16], and screen printing [17] routes have been described. Generally, the thickness of the electrolyte films produced by these methods is in the range of 10-50 m. Ding et al [18] investigated the influence of the thickness of Gd 0.1 Ce 0.9 O 1.95 (GDC) electrolyte membranes on the electrical performance of the anode-supported SOFCs.…”

Section: Introductionmentioning

confidence: 99%