Sputtered YSZ based protective thin films for SOFCs

Abstract

Protective Zr(Y)O 22d based films, deposited using magnetron sputtering, onto apatite type ceramics, were appraised for potential applications in solid oxide fuel cells with silicate based solid electrolytes, where performance may suffer from surface decomposition processes in reducing atmospheres. While as prepared Zr(Y)O 22d films without copper additive were already crystallised and single phase, fresh Cu containing Zr(Y)O 22d are essentially amorphous, requiring high temperature treatment in air for crystallisation. Deposition rate of 0?50-0?75 mm h 21 at sputtering power of 300 W was achieved. Surface morphology studies using atomic force microscope revealed typical film structures with small (,50 nm) grains. The hardness of films decreases from 15?8 to 8?4 GPa with increasing copper content. Polarisation studies of electrochemical cell with cermet anodes, applied over protective films, suggested that electrochemical reaction is essentially governed by oxygen anion transfer from zirconia phase and/or hydrogen oxidation in vicinity of zirconia film surface. Copper incorporation into Zr(Y)O 22d film leads to higher anode resistivity.

Chemically deposited magnesium hydroxide thin film

“…Nowadays, thin films are considered as a highly promising material for biomedical, energy, optical, sensing related applications [1][2][3][4] as well as for corrosion protection of magnesium alloys. [5][6][7][8] In this regard, magnesium oxide is a very important protective material that can be in situ formed from the magnesium hydroxide [Mg(OH) 2 ] thin film 9 precursors.…”