2008
DOI: 10.1016/j.microrel.2008.03.010
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Yield challenges in wafer stacking technology

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Cited by 12 publications
(4 citation statements)
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“…For the test cost, we assume a test cost per die t die = 0.23 cent [3,11]. We assume that the interconnect test are 100 less in cost, similar as in [27].…”
Section: Process Parametersmentioning
confidence: 99%
“…For the test cost, we assume a test cost per die t die = 0.23 cent [3,11]. We assume that the interconnect test are 100 less in cost, similar as in [27].…”
Section: Process Parametersmentioning
confidence: 99%
“…It should be noted that wafer stacking is a serial process and, as a consequence, the extent of three-dimensionality that could be achieved is limited; hence, wafer stacking actually achieves a 2.5D architecture, and not a truly 3D architecture. In addition, wafer stacking comes with its own challenge: the alignment of the vias [ 14 , 15 ].…”
Section: Introductionmentioning
confidence: 99%
“…[8] ). Such vertical integration solutions suffer from power dissipation problems, low interconnect density (because of a poor accuracy of wafer alignment, as compared with that of photolithographic masks defining features on a single wafer for multiple metallization layers), low yields (due to the lack of the known-good-die assembly), and poor cost efficiency [9] . As a result, such solutions cannot provide adequate density and throughput that will be required, for example, for real time signal processing from focal plane arrays [10] .…”
Section: Introductionmentioning
confidence: 99%