Abstract:YBaCuO films of about 1 pm thickness have been deposited by Metal organic chemical vapor deposition (MOCVD) on biaxially textured Ni-based substrates. Different buffer layers (MgO, YSZ, CeOz), and also NiO epitaxially grown on Ni, have been tested with subsequent YBCO deposition in the same reactor. When using NiO as first buffer layer, Ni-based substrates were oxidized in a Rapid thermal processing system or in a conventional furnace previous to deposition of the second buffer layer. In the present work, we s… Show more
“…1 H NMR (400 MHz, C 6 D 6 , δ): -8.0, -5. 5 Single-Crystal X-ray Diffraction Studies. X-ray data for single crystals of lanthanide complexes 4-7, 9, 10, and 12 [grown from pentane solution and mounted on a glass fiber with Paratone-N (Exxon)] were collected on a CCD area detector with graphitemonochromated Mo KR radiation.…”
“…The growth and properties of lanthanide-containing oxide films is of great current interest to the chemistry, materials science, and electronics communities. − Applications include multilayer device buffer layers (e.g., CeO 2 ), − high dielectric constant (high- k ) materials (e.g., Gd 2 O 3 ), , high- temperature superconductors (e.g., LnBa 2 Cu 3 O 7 - δ ), − phosphor dopants, − solid-state oxide fuel cells, and magnetic materials …”
Section: Introductionmentioning
confidence: 99%
“…The growth and properties of lanthanide-containing oxide films is of great current interest to the chemistry, materials science, and electronics communities. [1][2][3][4] Applications include multilayer device buffer layers (e.g., CeO 2 ), [5][6][7][8][9][10][11][12] high dielectric constant (high-k) materials (e.g., Gd 2 O 3 ), 13,14 temperature superconductors (e.g., LnBa 2 Cu 3 O 7-δ ), [15][16][17] phosphor dopants, 18-21 solid-state oxide fuel cells, 22 and magnetic materials. 23 MOCVD (metal-organic chemical vapor deposition) offers many attractions for oxide film growth, including low equipment costs, straightforward scale-up, conformal deposition on a variety of complex substrates, low growth temperatures, and rapid growth rates.…”
Section: Introductionmentioning
confidence: 99%
“…In this contribution, lanthanide β-ketoiminate complexes of type VIII are named according to the substitution at the R 1 , R 2 , and R 3 sites, "Ln(R 1 R 2 R 3 ) 3 ," and the noncoordinated protonated ligands are simply "H(R 1 R 2 R 3 )." CeO 2 , with a cubic fluorite crystal structure (a ) 5.411 Å), 83 has been widely investigated as a protective buffer layer for high-temperature superconductor (HTS) films in currentcarrying applications [5][6][7][8][9] and as an insulating layer in multilayer electronic devices. [10][11][12] Compared to YSZ, CeO 2 is a more attractive buffer layer for superconducting YBa 2 Cu 3 O 7-δ (YBCO) because of the smaller lattice mismatch and similar thermal expansion coefficient.…”
A new class of volatile, low-melting, fluorine-free lanthanide metal-organic chemical vapor deposition (MOCVD) precursors has been developed. The neutral, monomeric Ce, Nd, Gd, and Er complexes are coordinatively saturated by a versatile, multidentate ether-functionalized beta-ketoiminato ligand series, the melting point and volatility characteristics of which can be tuned by altering the alkyl substituents on the keto, imino, and ether sites of the ligand. Direct comparison with conventional lanthanide beta-diketonate complexes reveals that the present precursor class is a superior choice for lanthanide oxide MOCVD. Epitaxial CeO(2) buffer layer films can be grown on (001) YSZ substrates by MOCVD at significantly lower temperatures (450-650 degrees C) than previously possible by using one of the newly developed cerium beta-ketoiminate precursors. Films deposited at 540 degrees C have good out-of-plane (Deltaomega = 0.85 degrees ) and in-plane (Deltaphi = 1.65 degrees ) alignment and smooth surfaces (rms roughness approximately 4.3 A). The film growth rate decreases and the films tend to be smoother as the deposition temperature is increased. High-quality yttrium barium copper oxide (YBCO) films grown on these CeO(2) buffer layers by pulsed organometallic molecular beam epitaxy exhibit very good electrical transport properties (T(c) = 86.5 K, J(c) = 1.08 x 10(6) A/cm(2) at 77.4 K).
“…1 H NMR (400 MHz, C 6 D 6 , δ): -8.0, -5. 5 Single-Crystal X-ray Diffraction Studies. X-ray data for single crystals of lanthanide complexes 4-7, 9, 10, and 12 [grown from pentane solution and mounted on a glass fiber with Paratone-N (Exxon)] were collected on a CCD area detector with graphitemonochromated Mo KR radiation.…”
“…The growth and properties of lanthanide-containing oxide films is of great current interest to the chemistry, materials science, and electronics communities. − Applications include multilayer device buffer layers (e.g., CeO 2 ), − high dielectric constant (high- k ) materials (e.g., Gd 2 O 3 ), , high- temperature superconductors (e.g., LnBa 2 Cu 3 O 7 - δ ), − phosphor dopants, − solid-state oxide fuel cells, and magnetic materials …”
Section: Introductionmentioning
confidence: 99%
“…The growth and properties of lanthanide-containing oxide films is of great current interest to the chemistry, materials science, and electronics communities. [1][2][3][4] Applications include multilayer device buffer layers (e.g., CeO 2 ), [5][6][7][8][9][10][11][12] high dielectric constant (high-k) materials (e.g., Gd 2 O 3 ), 13,14 temperature superconductors (e.g., LnBa 2 Cu 3 O 7-δ ), [15][16][17] phosphor dopants, 18-21 solid-state oxide fuel cells, 22 and magnetic materials. 23 MOCVD (metal-organic chemical vapor deposition) offers many attractions for oxide film growth, including low equipment costs, straightforward scale-up, conformal deposition on a variety of complex substrates, low growth temperatures, and rapid growth rates.…”
Section: Introductionmentioning
confidence: 99%
“…In this contribution, lanthanide β-ketoiminate complexes of type VIII are named according to the substitution at the R 1 , R 2 , and R 3 sites, "Ln(R 1 R 2 R 3 ) 3 ," and the noncoordinated protonated ligands are simply "H(R 1 R 2 R 3 )." CeO 2 , with a cubic fluorite crystal structure (a ) 5.411 Å), 83 has been widely investigated as a protective buffer layer for high-temperature superconductor (HTS) films in currentcarrying applications [5][6][7][8][9] and as an insulating layer in multilayer electronic devices. [10][11][12] Compared to YSZ, CeO 2 is a more attractive buffer layer for superconducting YBa 2 Cu 3 O 7-δ (YBCO) because of the smaller lattice mismatch and similar thermal expansion coefficient.…”
A new class of volatile, low-melting, fluorine-free lanthanide metal-organic chemical vapor deposition (MOCVD) precursors has been developed. The neutral, monomeric Ce, Nd, Gd, and Er complexes are coordinatively saturated by a versatile, multidentate ether-functionalized beta-ketoiminato ligand series, the melting point and volatility characteristics of which can be tuned by altering the alkyl substituents on the keto, imino, and ether sites of the ligand. Direct comparison with conventional lanthanide beta-diketonate complexes reveals that the present precursor class is a superior choice for lanthanide oxide MOCVD. Epitaxial CeO(2) buffer layer films can be grown on (001) YSZ substrates by MOCVD at significantly lower temperatures (450-650 degrees C) than previously possible by using one of the newly developed cerium beta-ketoiminate precursors. Films deposited at 540 degrees C have good out-of-plane (Deltaomega = 0.85 degrees ) and in-plane (Deltaphi = 1.65 degrees ) alignment and smooth surfaces (rms roughness approximately 4.3 A). The film growth rate decreases and the films tend to be smoother as the deposition temperature is increased. High-quality yttrium barium copper oxide (YBCO) films grown on these CeO(2) buffer layers by pulsed organometallic molecular beam epitaxy exhibit very good electrical transport properties (T(c) = 86.5 K, J(c) = 1.08 x 10(6) A/cm(2) at 77.4 K).
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