2007
DOI: 10.1021/jp0718000
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XPS and QCM Studies of Hydrocarbon and Fluorocarbon Polymer Films Bombarded by 1−20 keV C60 Ions

Abstract: Poly(methyl methacrylate) or PMMA, Teflon AF1600, and poly(3-hexylthiophene) films are studied after bombardment with different fluences of C60 ions with energies of 1−20 keV by a quartz crystal microbalance (QCM) and X-ray photoelectron spectroscopy (XPS). C 1s XP spectra show little or no change in the film chemistry upon ion bombardment up to 1013−1014 ions/cm2. This result supports prior observations from secondary ion yields that at least some organic films have no apparent static limit in secondary ion m… Show more

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Cited by 11 publications
(15 citation statements)
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“…2024 It is shown here that ultrashort pulse laser ablation should be feasible for depth profiling of tissue with a few tens of microns depth resolution when used in combination with an MS analysis method. Furthermore, prior work with ultrashort pulse micromachining indicates a potential for sub-µm depth resolution.…”
Section: Discussionmentioning
confidence: 94%
See 1 more Smart Citation
“…2024 It is shown here that ultrashort pulse laser ablation should be feasible for depth profiling of tissue with a few tens of microns depth resolution when used in combination with an MS analysis method. Furthermore, prior work with ultrashort pulse micromachining indicates a potential for sub-µm depth resolution.…”
Section: Discussionmentioning
confidence: 94%
“…19 By contrast, the extent of chemical damage during cluster ion depth profiling in secondary ion mass spectrometry has been extensively explored. 2024 …”
Section: Introductionmentioning
confidence: 99%
“…The impact of water cluster ions following-up enhances the ejection of methacrylic acid molecule at the monomer state from the surface. Thus, the high rate sputtering of PMMA surfaces is achieved by both the chemical erosion of the surface and the momentum transfer of the incident energy, which is different from the sputtering of PMMA surfaces reported elsewhere [15][16][17]. Figure 3 shows the dependence of sputtered depth for Si(100) and SiO 2 surfaces on the ion dose.…”
Section: Resultsmentioning
confidence: 84%
“…Figure 2 shows the dependence of sputtered depth for Si(100), SiO 2 and PMMA surfaces on acceleration voltage for water cluster ions. The ion dose was 1.0×10 16 ions/cm 2 , and the cluster size used was larger than 300 molecules per cluster. As shown in the figure, the sput- tered depth increases with increase of the acceleration voltage, and it is 37 nm for Si, 49 nm for SiO 2 , and 2.9 µm for PMMA substrates, respectively at an acceleration voltage of 9 kV.…”
Section: Resultsmentioning
confidence: 99%
“…The instrumentation used in this work for ion bombardment and X-ray photoelectron analysis has been previously described [58][59][60]. The ion irradiation layout can be seen in Figure 1.…”
Section: Methodsmentioning
confidence: 99%