Metal impurity-assisted formation of nanocone arrays on Si by low energy ion-beam irradiation

Lloyd, K.; Bolotin, Igor L.; Schmeling, Martina; Hanley, Luke; Veryovkin, I. V.

doi:10.1016/j.susc.2016.03.016

Cited by 12 publications

(5 citation statements)

References 78 publications

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“…Specifically, it has been proposed that a key process behind patterning of silicon surfaces by IBS with metal codeposition is the formation of silicides on the surface [24,26,28,[31][32][33]. However, there are other works where the key role of silicide formation is questioned [34,35].…”

Section: Introductionmentioning

confidence: 99%

Highly ordered silicide ripple patterns induced by medium-energy ion irradiation

et al. 2020

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We study the nanopatterning of silicon surfaces under near-normal 40-keV Ar + sputtering with simultaneous Fe oblique codeposition. The ion-beam incidence was kept at 15°, for which no pattern is produced in the absence of metal incorporation. Morphological and compositional analyses were performed by atomic force microscopy, in its morphological and electrical modes, Rutherford backscattering spectrometry, x-ray photoelectron spectroscopy, scanning Auger, as well as transmission and scanning electron microscopy. Initially, nanodot structures randomly emerge, which, with increasing ion fluence, become progressively aligned along the perpendicular direction to the Fe flux. With increasing fluence, they coalesce, leading to a ripple pattern. The pattern dynamics and characteristics are faster and enhanced, respectively, as the distance to the metal source decreases (i.e., as the metal content increases). For the highest metal flux, the ripples can become rather large (up to 18 μm) and straighter, with few defects, and a pattern wavelength close to 500 nm, while keeping the surface roughness close to 15 nm. Furthermore, for a fixed ion fluence, the pattern order is improved for higher metal flux. In contrast, the pattern order enhancement rate with ion fluence does not depend on the metal flux. Our experimental observations agree with the predictions and assumptions of the model by Bradley [R. M. Bradley, Phys. Rev. B 87, 205408 (2013)] Several compositional and morphological studies reveal that the ripple pattern is also a compositional one, in which the ripple peaks have a higher iron silicide content, in agreement with the model. Likewise, the ripple structures develop along the perpendicular direction to the Fe flux, and the pattern wavelength increases as the metal flux decreases with a behavior qualitatively consistent with the model predictions.

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Section: Introductionmentioning

confidence: 99%

Highly ordered silicide ripple patterns induced by medium-energy ion irradiation

et al. 2020

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“…However, this scenario is questioned by other reports where surface patterning occurs even when silicides do not form [195,196]. A special case is that of gold, which does not form a silicide and was reported not to lead to surface patterning [114], although this fact is questioned [197].…”

Section: Chemical Effectsmentioning

confidence: 95%

Surface nanopatterning by ion beam irradiation: compositional effects

Vazquez

Redondo-Cubero

Lorenz

et al. 2022

J. Phys.: Condens. Matter

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Surface nanopatterning induced by ion beam irradiation (IBI) has emerged as an effective nanostructuring technique since it induces patterns on large areas of a wide variety of materials, in short time, and at low cost. Nowadays, two main subfields can be distinguished within IBI nanopatterning depending on the irrelevant or relevant role played by the surface composition. In this review, we give an up-dated account of the progress reached when surface composition plays a relevant role, with a main focus on IBI surface patterning with simultaneous co-deposition of foreign atoms. In addition, we also review the advances in IBI of compound surfaces as well as IBI systems where the ion employed is not a noble gas species. In particular, for the IBI with concurrent metal co-deposition, we detail the chronological evolution of these studies because it helps us to clarify some contradictory early reports. We describe the main patterns obtained with this technique as a function of the foreign atom deposition pathway, also focusing in those systematic studies that have contributed to identify the main mechanisms leading to the surface pattern formation and development. Likewise, we explain the main theoretical models aimed at describing these nanopattern formation processes. Finally, we address two main special features of the patterns induced by this technique, namely, the enhanced pattern ordering and the possibility to produce both morphological and chemical patterns.

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“…Other less common applications of surface analysis include space returned samples and nanostructured materials [105][106][107]. Samples from the NASA Genesis mission were investigated for surface contamination after the space craft crash landed upon return to Earth.…”

Section: Surface and Thin-layer Analysismentioning

confidence: 99%

Total reflection X-ray fluorescence

Schmeling

2019

Physical Sciences Reviews

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Abstract Total reflection X-ray fluorescence (TXRF) spectrometry is a non-destructive and surface sensitive multi-element analytical method based on energy dispersive X-ray fluorescence spectrometry with detection limits in the lower picogram range. It utilizes the total reflection of the primary X-ray beam at or below the critical angle of incidence. At this angle, the fluorescence intensity is substantially enhanced for samples present as small granular residue or as thin homogenous layer deposited at the surface of a thick substrate. Generally, two types of application exist: micro- and trace-analysis as well as surface and thin-layer analysis. For micro- and trace-analysis, a small amount of the solid or liquid sample is deposited on an optically flat substrate, typically quartz or polycarbonate. The dried residue is analyzed at a fixed angle setting slightly below the critical angle. Quantification is carried out by means of internal standardization. For surface and thin-layer analysis, the surface of an optically flat substrate is scanned. Variations of the incident angle of the primary X-ray beam provide information about the type and sometimes also the amount of material present at or slightly below the surface of the substrate. Major fields of application are environmental samples, biological tissues, objects of cultural heritage, semiconductors and thin-layered materials and films.

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Metal impurity-assisted formation of nanocone arrays on Si by low energy ion-beam irradiation

Cited by 12 publications

References 78 publications

Highly ordered silicide ripple patterns induced by medium-energy ion irradiation

Highly ordered silicide ripple patterns induced by medium-energy ion irradiation

Surface nanopatterning by ion beam irradiation: compositional effects

Total reflection X-ray fluorescence

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