Surface nanopatterning by ion beam irradiation: compositional effects

Abstract

Surface nanopatterning induced by ion beam irradiation (IBI) has emerged as an effective nanostructuring technique since it induces patterns on large areas of a wide variety of materials, in short time, and at low cost. Nowadays, two main subfields can be distinguished within IBI nanopatterning depending on the irrelevant or relevant role played by the surface composition. In this review, we give an up-dated account of the progress reached when surface composition plays a relevant role, with a main focus on IBI surface patterning with simultaneous co-deposition of foreign atoms. In addition, we also review the advances in IBI of compound surfaces as well as IBI systems where the ion employed is not a noble gas species. In particular, for the IBI with concurrent metal co-deposition, we detail the chronological evolution of these studies because it helps us to clarify some contradictory early reports. We describe the main patterns obtained with this technique as a function of the foreign atom deposition pathway, also focusing in those systematic studies that have contributed to identify the main mechanisms leading to the surface pattern formation and development. Likewise, we explain the main theoretical models aimed at describing these nanopattern formation processes. Finally, we address two main special features of the patterns induced by this technique, namely, the enhanced pattern ordering and the possibility to produce both morphological and chemical patterns.

Towards ordered Si surface nanostructuring: role of an intermittent ion beam irradiation approach

“…A separate study done by the same group also showed that excellent ripple ordering can be achieved by Xe + ions at low ion incidence angles even at moderate ion fluences and also for a diverging incident ion beam [26,27]. However, these results may be affected by inadvertent, uncontrolled co-deposition of metallic impurities during the irradiation process [8,28]. Further, ripple ordering properties at particular incidence energies have been observed to depend on the bombarding ion species [29], while non-standard irradiation setups like sequential and/or dual IBI [21,30,31] have been also employed with the goal to reduce pattern defects.…”

Fabrication of Variable Morphologies on Argon Sputtered PMMA Surfaces

“…Ion beam induced patterning and structuring in materials is a rapidly evolving field with a wide range of applications, including micro-and nanofabrication, surface modification, and materials engineering. Reports are available in the existing literature describing the use of this versatile technique for creation of diverse morphologies over different classes of materials [12][13][14][15][16][17][18][19][20][21][22][23].…”

“…Vazquez et al [12] have given an up-dated account of the progress reached when surface composition plays a relevant role, with a main focus on ion beam irradiation surface patterning with simultaneous co-deposition of foreign atoms. Further, they have reviewed the advances in ion beam irradiation of compound surfaces as well as ion beam irradiation systems where the ion employed is not a noble gas species.…”

Carbon ion beam induced chemical modification and nano-pyramid growth on Si surface

“…Recently, it has been reported that isolated dots can be fabricated by ion irradiation on prepatterned nano-templates [3][4][5][6] ,which is applicable for advanced electronic, optoelectronic and magnetic device development. A good number of experimental and theoretical studies on ion-induced surface pattern formation are reported [7,8], however, the understanding is not yet complete. The most important unexplored part is the chemical effect on such structure formation and the structure transformation at very high ion fluence.…”