Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithography

Allain, Jean Paul; Hassanein, A.; Allain, Monica M. C.; Heuser, Brent J.; Nieto, M.; Chrobak, C.; Rokusek, D. L.; Rice, Bryan J.

doi:10.1016/j.nimb.2005.08.188

Cited by 10 publications

(6 citation statements)

References 3 publications

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“…This difference may be due to the low Sn absorption properties of Ru compared to Pd. The surface roughness evolution measured for both MLM and SLM systems does not increase above 1-2 nm rms [3,8]. Therefore, surface roughness increase under energetic particle irradiation is expected to be moderate and consequently the decrease of 13.5-nm reflectivity to be negligible.…”

Section: Discussionmentioning

confidence: 86%

“…Previous experimental results on Ru GI and MLM mirror surfaces have shown that when exposed to energetic particles, the surface roughness does not increase beyond a 1 to 1.5-nm rms roughness value [3,8]. This is primarily due to the stepped microrelief (enhanced roughness) during sputtering of polycrystalline (PC) thin films being much less than solid PC metals due to relatively small grain size in thin films [9].…”

Section: Effect Of Surface Roughness On 135-nm Reflectivitymentioning

confidence: 92%

“…As mentioned earlier, energetic particles can induced interface roughness and thus reduce near-normal 13.5-nm reflectivity due to ion-induced mixing. Previous results have demonstrated this effect and only summarized here [3]. Xe + irradiations of Ru-capped and uncapped MLM systems for various fluences, two incident Xe ion energies (1-keV and 5-keV) and two sample temperatures: 298 K and 473 K were completed in previous studies.…”

Section: Effect Of Fast Particles On Mlm Reflectivity At 135-nmmentioning

confidence: 96%

“…Over large fluences however, ion-mixing effects coupled to prolonged sputtering can induce damage in several nm in depth. This can be particularly damaging to the first few bilayers used in typical MLM systems with a thickness of approximately 6-7 nm [3].…”

Section: Introductionmentioning

confidence: 99%

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Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

et al. 2007

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Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence.Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering.In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

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Section: Discussionmentioning

confidence: 86%

Section: Effect Of Surface Roughness On 135-nm Reflectivitymentioning

confidence: 92%

Section: Effect Of Fast Particles On Mlm Reflectivity At 135-nmmentioning

confidence: 96%

Section: Introductionmentioning

confidence: 99%

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Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

et al. 2007

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“…Long-term stability and ease of operation are major issues in this context. In particular, a major problem of laser-produced and especially gas discharge plasma sources is the nearly inevitable generation of debris particles, which can severely damage optical elements in relatively close vicinity to the plasma, especially condenser mirrors [14]. Regarding laser-produced plasma sources, alternatives to solid or liquid jet target concepts should be considered in order to reduce or totally avoid optics degradation from debris.…”

Section: Introductionmentioning

confidence: 99%

Table-top soft x-ray microscope using laser-induced plasma from a pulsed gas jet

Müller¹,

Mey²,

Niemeyer³

et al. 2014

Opt. Express

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An extremely compact soft x-ray microscope operating in the "water window" region at the wavelength λ = 2.88 nm is presented, making use of a long-term stable and nearly debris-free laser-induced plasma from a pulsed nitrogen gas jet target. The well characterized soft x-ray radiation is focused by an ellipsoidal grazing incidence condenser mirror. Imaging of a sample onto a CCD camera is achieved with a Fresnel zone plate using magnifications up to 500x. The spatial resolution of the recorded microscopic images is about 100 nm as demonstrated for a Siemens star test pattern.

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Computer Simulation of the Origination Porosity

Zmievskaya

Bondareva

Савченко

et al. 2012

Advanced Structured Materials

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Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithography

Cited by 10 publications

References 3 publications

Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

Table-top soft x-ray microscope using laser-induced plasma from a pulsed gas jet

Computer Simulation of the Origination Porosity

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