X-Ray Spectroscopy

Agarwal, Basant

doi:10.1007/978-3-540-38668-1

Cited by 206 publications

(69 citation statements)

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“…The x-ray EDS image shown in Fig. 15,16 The presence of the wider aluminum lines and smaller openings (silicon) for the 60% fill factor 10-μm period grating is clearly observed. The x-ray EDS image shown in Fig.…”

Section: Resultsmentioning

confidence: 92%

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Bilayer lift-off process for aluminum metallization

Wilson

Korolev

Crow

2015

J. Micro/Nanolith. MEMS MOEMS

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Recently published reports in the literature for bilayer lift-off processes have described recipes for the patterning of metals that have recommended metal-ion-free developers, which do etch aluminum. We report the first measurement of the dissolution rate of a commercial lift-off resist (LOR) in a sodium-based buffered commercial developer that does not etch aluminum. We describe a reliable lift-off recipe that is safe for multiple process steps in patterning thin (<100 nm) and thick aluminum devices with micron-feature sizes. Our patterning recipe consists of an acid cleaning of the substrate, the bilayer (positive photoresist/LOR) deposition and development, the sputtering of the aluminum film along with a palladium capping layer and finally, the lift-off of the metal film by immersion in the LOR solvent. The insertion into the recipe of postexposure and sequential develop-bake-develop process steps are necessary for an acceptable undercut. Our recipe also eliminates any need for accompanying sonication during lift-off that could lead to delamination of the metal pattern from the substrate. Fine patterns were achieved for both 100-nm-thick granular aluminum/palladium bilayer bolometers and 500-nm-thick aluminum gratings with 6-μm lines and 4-μm spaces. Wilson, Korolev, and Crow: Bilayer lift-off process for aluminum metallization Downloaded From: http://nanolithography.spiedigitallibrary.org/ on 05/15/2015 Terms of Use: http://spiedl.org/terms Wilson, Korolev, and Crow: Bilayer lift-off process for aluminum metallization Downloaded From: http://nanolithography.spiedigitallibrary.org/ on 05/15/2015 Terms of Use: http://spiedl.org/terms

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Section: Resultsmentioning

confidence: 92%

“…Energy-dispersive x-ray spectroscopy (EDX or EDS) 15,16 has been performed in order to correlate the elemental compositions of the samples with the topological/atomic mass contrast seen in the images shown in Fig. 5.…”

Section: Resultsmentioning

confidence: 99%

Bilayer lift-off process for aluminum metallization

Wilson

Korolev

Crow

2015

J. Micro/Nanolith. MEMS MOEMS

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“…For atomic hydrogen, it is known that x ¼ 4 and y ¼ 3.5. 5,6 However, in the existing literature, no single unique value for the exponents x and y are recorded, which satisfies the data for a variety of substances. The suggested values lie in the range, 3.0 y 3.5 and 3.0 x 3.8.…”

Section: Introductionmentioning

confidence: 74%

X-ray attenuation coefficient of mixtures: Inputs for dual-energy CT

et al. 2011

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“…. states in the VB around each component of a solid since X-ray transitions involve an inner level of the solid and obey dipole selection rules [7]. Transition probabilities are usually constant or vary slowly within the energy range of a band; therefore, XES data are proportional to the probed occupied densities of states (DOS).…”

Section: Underlying Principlesmentioning

confidence: 99%