X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors

Yamada, Jumpei; Inoue, Takato; Nakamura, Nobutomo; Kameshima, Takashi; Yamauchi, Kazuto; Matsuyama, Satoshi; Yabashi, Makina

doi:10.3390/s20247356

Cited by 10 publications

(6 citation statements)

References 41 publications

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“…The laterally graded Pt/C multilayers and the Pt monolayers were formed using a DC magnetron sputtering deposition 27,48 . The mirror surface finishing was performed using a wavefront correction technique 33 that combines a single-grating interferometer and the differential deposition method. Shape errors were derived from the measured wavefront errors using the designed distributions of incident angles.…”

Section: Methods Mirror Design and Fabricationmentioning

confidence: 99%

“…Furthermore, the mirrors have very steeply curved surfaces with a minimum radius of curvature of 3 m that could not be measured with 0.74 nm accuracy even by cutting-edge visible-light metrology. Consequently, we employed an X-ray wavefront sensing technique 12,33 which could achieve a high accuracy due to the at-wavelength measurement scheme. After pre-manufacturing the AKB mirrors, we performed an X-ray focusing experiment and measured X-ray wavefront errors using a single-grating interferometer (s-GI) 33 .…”

Section: Wolter Iii-based Akb Mirrorsmentioning

confidence: 99%

“…Consequently, we employed an X-ray wavefront sensing technique 12,33 which could achieve a high accuracy due to the at-wavelength measurement scheme. After pre-manufacturing the AKB mirrors, we performed an X-ray focusing experiment and measured X-ray wavefront errors using a single-grating interferometer (s-GI) 33 .…”

Section: Wolter Iii-based Akb Mirrorsmentioning

confidence: 99%

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Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity

Yamada,

Matsuyama,

Inoue

et al. 2024

Nat. Photon.

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By illuminating matter with bright and intense light, we gain profound insights into its composition and property. In the regime of extremely short wavelengths, X-ray free-electron lasers (XFELs) with exceptional peak brilliance have unveiled crucial details about the structures, dynamics, and physics of various materials. Although X-ray focusing optics to enhance the intensity have progressed, achieving a singlenanometre focusing spot that fully exploits the source performance has remained elusive. Aberrations arising from reflective optical schemes noticeably degrade the focus, in conjunction with the inevitable angular transition and pointing errors. Here, we present an innovative approach that directly forms a source image into a tiny focusing spot, achieving 7 nm focusing of 9.1-keV XFELs with the unprecedented intensity of 1.45 × 10 22 W/cm 2 . This breakthrough was made possible by a scheme combining concave and convex X-ray mirrors with suppressed aberrations and high angular tolerances. The attained highly intense XFELs, surpassing the previous intensity by a hundred-fold, induced the vigorous ionization of chromium, suggesting the creation of solid-density heavy bare atomic nuclei. Our results, which realize stable ultraintense XFEL beams by forming demagnified source images, hold immediate significance in wide research fields, including atomic, molecular and optical physics and high-energy-density sciences.Since the discovery of X-rays by W. C. Röntgen, the development of X-ray sources has continually progressed, driven by the increasing significance of X-rays in diverse scientific fields. The advent of bright synchrotron radiation has marked a momentous milestone 1-3 , and more recently, the emergence of X-ray free-electron lasers (XFELs) 4-8 based on self-amplified spontaneous emission (SASE) 9,10 has revolutionized the growth of peak brilliance. X-rays emitted from these bright sources have been focused into small spots, thereby enhancing the resolution and sensitivity of X-ray analyses and contributing to a wide range of studies 11,12 . The state-of-the-art Xray sources possessing an ultra-low emittance, that is, small source size and low angular divergence, offer distinct advantages for generating high-intensity focusing spots. Specifically, the small source size facilitates achieving a

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Section: Methods Mirror Design and Fabricationmentioning

confidence: 99%

Section: Wolter Iii-based Akb Mirrorsmentioning

confidence: 99%

See 1 more Smart Citation

Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity

Yamada,

Matsuyama,

Inoue

et al. 2024

Nat. Photon.

Self Cite

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“…The careful control of each source of error in the measurement of the distorted wavefront, associated with highly accurate differential coating deposition, to optimize the shape of the optics, permits the realization of a diffraction-limited spot in the hard X-ray. The entire process is described in the sixth contribution [ 6 ].…”

Section: Contributed Papersmentioning

confidence: 99%

Special Issue “EUV and X-ray Wavefront Sensing”

Idir

Cocco

Huang

2022

Sensors

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“…Although the absorption by the prisms created additional gradients in intensity across illumination apertures, speckle-like distortions did not appear, which indicates that the density of the prisms is sufficiently uniform. Additionally, the wavefront aberration, including fidelities of the prisms and the AKB mirrors, was measured by singlegrating interferometry (Yamada et al, 2020). Fig.…”

Section: Nanoprobe Characterizationmentioning

confidence: 99%

Hard X-ray nanoprobe scanner

Yamada

Inoue

Osaka

et al. 2021

Int Union Crystallogr J

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X-ray scientists are continually striving to improve the quality of X-ray microscopy, due to the fact that the information obtained from X-ray microscopy of materials can be complementary to that obtained from optical and electron microscopes. In contrast to the ease with which one can deflect electron beams, the relative difficulty to deflect X-ray has constrained the development of scanning X-ray microscopes (SXMs) based on a scan of an X-ray small probe. This restriction has caused severe complications that hinder progress toward achieving ultimate resolution. Here, a simple and innovative method for constructing an SXM equipped with a nanoprobe scanner is proposed. The nanoprobe scanner combines X-ray prisms and advanced Kirkpatrick–Baez focusing mirrors. By rotating the prisms on the order of degrees, X-ray probe scanning with single-nanometre accuracy can be easily achieved. The validity of the concept was verified by acquiring an SXM image of a test pattern at a photon energy of 10 keV, where 50 nm line-and-space structures were resolved. This method is readily applicable to an SXM with a single-nanometre resolution and will assist effective utilization of increasing brightness of fourth-generation synchrotron radiation sources.

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X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors

Cited by 10 publications

References 41 publications

Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity

Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity

Special Issue “EUV and X-ray Wavefront Sensing”

Hard X-ray nanoprobe scanner

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