X-ray scattering by the fused silica surface etched by low-energy Ar ions

Барышева, М. М.; Чхало, Н. И.; Дроздов, М. Н.; Mikhailenko, M.S.; Pestov, A. E.; Salashchenko, N. N.; Vainer, Yu. A.; Yunin, P. A.; Zorina, M. V.

doi:10.3233/xst-190495

Cited by 9 publications

(4 citation statements)

References 39 publications

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“…Increasing the removal depth of IBE gradually is helpful to mitigate the impurity contamination and raise the LIDT. In addition, a disturbed layer containing lattice dislocation, vacancy, and displacement is formed as a result of Ar + ion bombardment, which is the subsurface damage that is different from the main material on the dielectric constant [29,30]. The volume inhomogeneities of the disturbed layer induced by IBE cannot be neglected.…”

Section: Discussionmentioning

confidence: 99%

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

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Section: Discussionmentioning

confidence: 99%

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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“…Particularly, the widely used white light interferometry method [25,26] gives satisfactory results only for surfaces with effective roughness of above 1 nm [21]. Presence of damaged layer, that results in additional scattering on volume inhomogeneities [29], significantly influences the diffuse X-ray scattering (DXRS) spectra [27,28]. Atomic force microscopy (AFM) [30] is affected by scanner nonlinearity, that appears at bigger, above 10 µm, frames [21].…”

Section: Roughness Measurement Methodsmentioning

confidence: 99%

Application of cerium oxide nanopowders for silicon polishing

et al. 2022

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The research methods and the first results obtained in the study of the roughness of single-crystal silicon (111) substrates processed at the final stage by various methods are described: traditional polishing without the use of chemical-mechanical polishing (CMP), with the use of CMP and without CMP, but with the use of oxide cerium nanopowders. The efficiency of using CeO2 nanopowders has been demonstrated. The following effective roughness values were obtained: without CMP - 3.56 nm, with CMP - 0.54 nm, and without CMP, but with CeO2 polishing - 0.93 nm. Keywords: Surface, roughness, X-ray optics, deep grinding-polishing.

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“…В частности, широко используемый метод интерферометрии белого света [25,26] удовлетворительно работает только для поверхностей с эффективной шероховатостью выше 1 nm [21]. На спектры диффузного рассеяния рентгеновского излучения (ДРРИ) [27,28] значительное влияние может оказать наличие нарушенного слоя, который приводит к дополнительному рассеянию на объемных неоднородностях [29]. Атомно-силовая микроскопия (АСМ) [30] страдает нелинейностью сканера, которая проявляется при больших, более 10 µm, кадрах [21].…”

Section: методы измерений шероховатостиunclassified

Применение Нанопорошков Окиси Церия Для Полировки Кремния

Чхало¹,

Ахсахалян²,

Вайнер³

et al. 2021

Журнал Технической Физики

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Описаны методы исследований и первые результаты, полученные при изучении шероховатости подложек из монокристаллического кремния (111), обработанных на финальной стадии различными способами: традиционная полировка без использования химико-механической полировки (ХМП), с использованием ХМП и без ХМП, но с применением нанопорошков окиси церия. Продемонстрирована эффективность использования нанопорошков CeO2. Были получены следующие значения эффективной шероховатости: без ХМП --- 3.56 nm, с ХМП --- 0.54 nm и без ХМП, но с полировкой CeO2 --- 0.93 nm. Ключевые слова: поверхность, шероховатость, рентгеновская оптика, глубокая шлифовка-полировка.

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X-ray scattering by the fused silica surface etched by low-energy Ar ions

Cited by 9 publications

References 39 publications

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Application of cerium oxide nanopowders for silicon polishing

Применение Нанопорошков Окиси Церия Для Полировки Кремния

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