1984
DOI: 10.1116/1.572547
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X-ray photoelectron and Auger electron spectroscopic study of the CdTe surface resulting from various surface pretreatments: Correlation of photoelectrochemical and capacitance-potential behavior with surface chemical composition

Abstract: The surface chemistry and stoichiometry of p- and n-type CdTe photoelectrodes treated with oxidizing and reducing etches have been characterized by x-ray photoelectron and Auger electron spectroscopies. The results of surface analysis have been correlated with the photoelectrochemical and capacitance–potential behavior of the photoelectrodes. ‘‘Oxidized’’ surfaces are covered by a thin Te0/TeO2 layer (or a thicker Te0 layer, if the etching procedure is slightly altered), resulting in Fermi level pinning: a con… Show more

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Cited by 98 publications
(21 citation statements)
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“…There have been several reports on the investigation of CdTe surface layers that result from various surface treatments. [1][2][3] The study of the surface composition of etched samples by x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy confirms cadmium ''washing out'' and enriching a surface by tellurium as a result of chemical treatment. For example, nitric acid, ethylenediaminetetraacetic acid (EDTA), and K 2 Cr 2 O 7 /Ag + solution leave the surface depleted of Cd over at least several nanometers and should be avoided in device fabrication.…”
Section: Introductionmentioning
confidence: 93%
See 1 more Smart Citation
“…There have been several reports on the investigation of CdTe surface layers that result from various surface treatments. [1][2][3] The study of the surface composition of etched samples by x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy confirms cadmium ''washing out'' and enriching a surface by tellurium as a result of chemical treatment. For example, nitric acid, ethylenediaminetetraacetic acid (EDTA), and K 2 Cr 2 O 7 /Ag + solution leave the surface depleted of Cd over at least several nanometers and should be avoided in device fabrication.…”
Section: Introductionmentioning
confidence: 93%
“…1 Bromine dissolved in methanol and mineral acids also leaves the surface depleted of Cd. 2 A nearly stoichiometric surface results from soaking of CdTe in an aqueous solution of KOH. 3 The best of all obtained surfaces, however, is a vacuum-heated and air-cleaved face, which seems to be stoichiometric and clean.…”
Section: Introductionmentioning
confidence: 99%
“…The compositions of native, anodic, chemical and photochemical oxides, as well as their generation techniques, have all been the subjects of investigation. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] A variety of sample preparations were also examined. Treatments with Br-based etches [2][3][4][5][6]8,10,11,[14][15][16] acids 3,9,16 and ion bombardment 1,3,15 are but a few of the simpler examples of the techniques used.…”
Section: Introductionmentioning
confidence: 99%
“…30 stoichiometry changes induced by a particular surface treatment or processing condition where relative changes are compared to a reference sample. 30,[41][42][43][44] However, in most cases, even the reference samples give Cd:Te ratios that deviate from the expected stoichiometric value 1:1, which typically goes unexplained. This work shows that the segregation at the surface of even sub-monolayers of Cd and Te leads to large enough deviations from stoichiometry to account for the variations seen in literature (typically about 610% from stoichiometry).…”
Section: Discussionmentioning
confidence: 99%