2015
DOI: 10.1134/s0022476615060232
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X-ray diffraction study of vertically aligned layers of h-BN, obtained by PECVD from borazine and ammonia or helium mixtures

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Cited by 8 publications
(7 citation statements)
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“…Aligned initially in parallel to the silicon substrate, the h-BN nanosheets have later bent and started vertical growth. The similar structure of interface has been reported for BNNWs fabricated by physical vapor deposition [59] and PECVD [60]. The HRTEM images of the middle of nanowalls in Figs.…”
Section: Structural Featuressupporting
confidence: 80%
“…Aligned initially in parallel to the silicon substrate, the h-BN nanosheets have later bent and started vertical growth. The similar structure of interface has been reported for BNNWs fabricated by physical vapor deposition [59] and PECVD [60]. The HRTEM images of the middle of nanowalls in Figs.…”
Section: Structural Featuressupporting
confidence: 80%
“…The temperature evolution of h-BN film morphology deposited on GaAs(100) is similar to that on Si(100) substrate. The samples obtained at low temperatures also had a smooth surface and were amorphous (based on x-ray diffraction (XRD) data) [14]. When the synthesis temperature increased and BNNWs were obtained, the XRD pattern showed them having a nanocrystalline structure.…”
Section: Resultsmentioning
confidence: 99%
“…Amorphous BN was located between the crystallites. The BNNW/GaAs(100) substrate interface was atomically smooth and had no amorphous interfacial layer, which is characteristic for the deposition of h-BN nanowalls on the Si(100) substrate [12][13][14]. However, the first BN layers were deposited parallel-aligned to the GaAs substrate and after that the BNNWs started to grow.…”
Section: Resultsmentioning
confidence: 99%
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“…A typical example is h-BN, which is a 2D insulator. The growth mechanism is still under investigation, but vertical h-BN flakes have been realized by PECVD already . Vertical 2D semiconductors, for example, MoS 2 is also synthesized, although with methods other than PECVD. , …”
Section: Discussionmentioning
confidence: 99%