Abstract:The local structure of amorphous LaNi5.0 films prepared by reactive sputtering was investigated using XAFS and was compared with that by conventional sputtering. The interatomic distances and coordination numbers of both films coincided. The structural fluctuation was, however, found to be smaller for the reactive sputtered film than for the conventional sputtered film, because small Debye-Waller factors were obtained for the reactive sputtered film.
“…The studies of EXAFS for LaNi 5 and its hydride are quite limited so far, especially on the temperature dependence of the DW factors of La and Ni [7][8][9][10]. In the present work we measured the EXAFS of the Ni K-edge and the La L 3 - …”
“…The studies of EXAFS for LaNi 5 and its hydride are quite limited so far, especially on the temperature dependence of the DW factors of La and Ni [7][8][9][10]. In the present work we measured the EXAFS of the Ni K-edge and the La L 3 - …”
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