Work function changes and surface chemistry of oxygen, hydrogen, and carbon on indium tin oxide

Effect of oxygen plasma treatment on the surface properties of tin-doped indium oxide substrates for polymer LEDs

“…The peak at bout 285.0 eV corresponds to C 1s, suggesting that carbon is the only major contaminant. Similar results have also been reported by several groups [37][38][39]. Fig.…”

Formation of metallic indium-tin phase from indium-tin-oxide nanoparticles under reducing conditions and its influence on the electrical properties

“…For reducing atmospheres either forming gas 10,19,20,22,23,[26][27][28][29][30] or low oxygen partial pressures 1,14,17,26,[31][32][33][34][35][36] are used. Furthermore, plasma treatments [37][38][39] as well as wet-chemical treatments [40][41][42] are ways to influence ITO's surface properties. The compilation in Table I shows the change of conductivity depending on the deposition method and postdeposition treatment.…”

“…45 Application-oriented works repeatedly reported the occurrence of metallic indium in different ITO layers. 4,10,[46][47][48] This formation is usually driven by strongly reducing conditions such as plasma-enhanced chemical-vapor deposition ͑PECVD͒, 39,49 ultrahigh vacuum ͑UHV͒, 5,12 and hydrogen gas 38 or acids in wet chemistry. 40,41 But also the neutrondiffraction study of González et al mentioned the occurrence of metallic indium after a reduction with the forming gas.…”

Modification of anode surface in organic light-emitting diodes by chalcogenes

“…The surface chemical functionality is not fully accepted: some authors submit the presence of surface hydroxyl [11] others-that concentration of OH is negligible [12], but it is quite evident that cleanliness and chemical state of the surface are critically important for the efficient hole-injection. Many recent reports describe the results of various forms of ITO surface modification including ultra-violet ozone cleaning, argon ion bombardment, oxygen plasma exposure, annealing, exposure by acids and bases, hydrogen peroxide, adsorption of metals with high workfunctions, dielectric oxides, copper phthalocyanine, and various organic compounds [4][5][6][7][8]10,[13][14][15][16][17][18][19]. However, although these treatments have been shown to increase the work-function of ITO and hole efficiency, possible physical decohesion at the hydrophobic HTL-hydrophilic oxide anode interface has frequently been ignored.…”