2007
DOI: 10.1143/jjap.46.l356
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White-Light Emission from Silicone Rubber Modified by 193 nm ArF Excimer Laser

Abstract: The photochemical surface modification of silicone ([SiO(CH3)2]n) rubber has been successfully demonstrated using a 193 nm ArF excimer laser, and white light of strong intensity was emitted upon exposure to a 325 nm He–Cd laser. The photoluminescence spectra of the modified silicone showed broad peaks centered at 410, 550, and 750 nm wavelengths. The modified surface was carbon-free silicon oxide, and the chemical composition ratio of O/Si was approximately 2. However, the surface was not silica glass (SiO2), … Show more

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Cited by 18 publications
(14 citation statements)
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References 12 publications
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“…5,6 The use of laser radiation offers a useful approach to the processing and selective surface functionalization of silicone. In particular, UV nanosecond laser pulses (e.g., KrF, ArF, and F 2 ) are largely applied for fabrication of optical elements, 7-9 deposition of thin films, 10-12 modification of optical properties, [13][14][15] and surface processing or functionalization. [16][17][18][19][20][21][22] For example, KrF excimer laser (k ¼ 248 nm) processing of siloxane-based flexible silicone rubber is used to photo-decompose the sample surface changing the surface relief.…”
Section: Introductionmentioning
confidence: 99%
“…5,6 The use of laser radiation offers a useful approach to the processing and selective surface functionalization of silicone. In particular, UV nanosecond laser pulses (e.g., KrF, ArF, and F 2 ) are largely applied for fabrication of optical elements, 7-9 deposition of thin films, 10-12 modification of optical properties, [13][14][15] and surface processing or functionalization. [16][17][18][19][20][21][22] For example, KrF excimer laser (k ¼ 248 nm) processing of siloxane-based flexible silicone rubber is used to photo-decompose the sample surface changing the surface relief.…”
Section: Introductionmentioning
confidence: 99%
“…In this case, the laser exposure conditions were 10-mJ/ cm 2 single pulse fluence, 10-Hz pulse repetition rate and 300-s irradiation time. To know the origin of the welding, X-ray photoelectron spectroscopy (XPS, Physical Electronics, PHI1600) was conducted [9]. In this case, the ArF excimer laser simply irradiated the silicone rubber; silica microspheres were not formed beforehand.…”
Section: Methodsmentioning
confidence: 99%
“…The ArF excimer laser modified silicone into a defective silicon oxide, but the modification layer emitted white light of strong intensity under an irradiation of 325 nm He-Cd laser [9]. When the fused silica microspheres are contacted with silicone rubber substrate, thus, we have thought out that they can be photochemically welded by irradiating ArF excimer laser through the silica microspheres as well.…”
Section: Introductionmentioning
confidence: 99%
“…Laser micromachining based on the direct laser ablation of materials is rapidly emerging as a powerful approach for readily controllable, low-cost, and versatile processing of multifunctional structures with complex 2D/3D hierarchical functional building blocks of several tens of micrometers or less . In particular, high-intensity short pulse lasers have been applied to the fabrication of optical elements, modification of optical properties, and surface processing or functionalization . Although femtosecond lasers have been used to process PDMS, , they are usually expensive and bulky and thus can hardly be used for large-scale production of PDMS.…”
Section: Introductionmentioning
confidence: 99%