2009
DOI: 10.1021/jp805708w
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Wetting Angles on Illuminated Ta2O5 Thin Films with Controlled Nanostructure

Abstract: Ta 2 O 5 thin films with different nanostructure and surface roughness have been prepared by electron evaporation at different angles between the evaporation source and the substrates. Large variation of refraction indexes (n) from 1.40 to 1.80 were obtained by changing the geometry of evaporation and/or by annealing the evaporated films at increasing temperatures up to 1000°C to make them crystalline. Very flat and compact thin films (n ) 2.02) were also obtained by assisting the growth by bombardment with O … Show more

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Cited by 30 publications
(33 citation statements)
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“…The different results obtained by these experiments can be due to the texture and microstructure of the copper film 276 , by the surface roughness or by defects present at the surface. Indeed, the surface roughness of metal oxide surfaces has been shown to have a direct influence on their wetting properties towards water, which in turn could have a direct influence on the formation of the native oxide 296 . In particular, very smooth copper surfaces are hydrophobic while rough surfaces (∼ 5 nm-high roughness) are hydrophilic 297 .…”
Section: Native Oxidation Of Copper In Ambient Conditionsmentioning
confidence: 99%
“…The different results obtained by these experiments can be due to the texture and microstructure of the copper film 276 , by the surface roughness or by defects present at the surface. Indeed, the surface roughness of metal oxide surfaces has been shown to have a direct influence on their wetting properties towards water, which in turn could have a direct influence on the formation of the native oxide 296 . In particular, very smooth copper surfaces are hydrophobic while rough surfaces (∼ 5 nm-high roughness) are hydrophilic 297 .…”
Section: Native Oxidation Of Copper In Ambient Conditionsmentioning
confidence: 99%
“…Another interesting feature in these spectra is the existence of some losses in the gap region, as indicated by the asterisk included in the figure. In a previous publication on InTaO 4 thin films prepared by chemical vapor deposition, 11 similar states were detected with a higher intensity. In the present case the exact energy of these states cannot be determined accurately because their spectroscopic features overlap with the band corresponding to the elastic peak.…”
Section: Electronic Characterization Of the Thin Filmsmentioning
confidence: 66%
“…From these spectra, band gap energies have been determined by extrapolation to zero the edge jump at around 5 eV. 17 The obtained values, collected in Table I, indicate that the three oxides have a wide band gap that ranges from around 4.2 eV for Ta 2 O 5 to 4.6 for InTaO 4 and In 0.9 Ni 0.1 TaO 4 . Another interesting feature in these spectra is the existence of some losses in the gap region, as indicated by the asterisk included in the figure.…”
Section: Electronic Characterization Of the Thin Filmsmentioning
confidence: 99%
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