Ways to eliminate PMMA residues on graphene —— superclean graphene

Zhuang, Bozhong; Li, Shiyun; Li, Siyang; Yin, Jun

doi:10.1016/j.carbon.2020.11.047

Cited by 68 publications

(69 citation statements)

References 134 publications

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“…16 To realize high-performing opto-electronic and photonic devices of technological relevance, flat and contaminant-free graphene over large scale is essential. Various methods have been used to address the issue of the polymer contamination on graphene, including stencil mask lithography, 17 mechanical cleaning with the tip of an atomic force microscope (AFM), 18,19 current-induced cleaning, 20 PMMA degradation by laser treatment, 21,22 high-temperature annealing 23–25 and wet chemical cleaning, 23,26,27 though each of these presents its own drawbacks. Stencil mask lithography relies on a physical mask placed in close proximity to the sample to define the metallic contacts or an etching pattern in graphene.…”

Section: Introductionmentioning

confidence: 99%

Ultra-clean high-mobility graphene on technologically relevant substrates

et al. 2022

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Section: Introductionmentioning

confidence: 99%

Ultra-clean high-mobility graphene on technologically relevant substrates

et al. 2022

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Section: Post Treatment After Transfermentioning

confidence: 99%

“…[38] Due to the instability of low power plasma, an ion beam irradiation method based on plasma treatment has also been proposed to remove PMMA residue on graphene surface. In addition to the plasma device, the ion beam device uses two grid plates with positive voltage and ground to produce a specific ion beam to bombard the sample [91] (Figure 10A). Among them, He and Ar ion beams are widely used.…”

Section: Post Treatment After Transfermentioning

confidence: 99%

“…Effective cleaning of graphene by physical absorption [90] Post treatment CF 4 /H 2 plasma Effective removal of residual PMMA [27] Post treatment after transfer Ion beam irradiation With a narrow and controllable energy distribution [91,92] Electron beam treatment Needing proper energy of the electron beam [93] Light treatment Relatively mild for graphene [94] Abbreviation: CTE, thermal expansion coefficient; CVD, chemical vapor deposition; PMMA, polymethylmethacrylate.…”

Section: Perspective and Prospectsmentioning

confidence: 99%

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The way towards for ultraflat and superclean graphene

Zhang

Fan

et al. 2021

Nano Select

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Large-scale and high-quality graphene have become an emerging and promising option in modern chemistry and physics due to their fascinating properties. In the past few years, there has been encouraging progress in the controlled manufacturing of large-size single crystal graphene. Chemical vapor deposition (CVD) draws much attention because of its fine control by regulating the growth parameters. However, in the process of CVD growth and subsequent transfer, wrinkle and contamination inevitably appear, which greatly compromises the photoelectric performance of graphene and is not conducive to further application. Herein, very recent progress for ultraflat and superclean graphene is presented. First, the wrinkle and contamination in the growth and transfer process are classified, and the formation mechanism is elucidated. Then the methods of reducing wrinkle and contamination are discussed from three aspects of growth, transfer, and posttreatment. Among them, CVD growth process is the first step to suppress contamination and wrinkle, which can be started from three important parameters in terms of catalyst, temperature, and carbon source. As for the subsequent transfer process, several new support materials and other methods including semi and dry transfer have been employed to address the concerns present for traditional PMMA material. Post-treatment is an additional treatment strategy for residues that have been formed in growth and transfer processes. In the last section, the photoelectric properties, and applications of ultraflat and superclean graphene are discussed, posing potential in wide applications.

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“…Moreover, common reliability disturbances such as interface states, traps and mobile charges also affect the sensing capability of the fabricated devices. Different strategies have been explored in order to clean of residues and improve the quality of the graphene sheet, as thermal annealing, plasma, UV-Vis light, electrical or mechanical treatments [11]. In this work, we have explored the ablation of the graphene layer using a visible laser as a straightforward and rapid treatment to improve the inter-device electrical variability in graphene-based liquid gate sensors.…”

Section: Introductionmentioning

confidence: 99%

Improved inter-device variability in graphene liquid gate sensors by laser treatment

Ávila

Galdon

Salazar

et al. 2021

2021 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EuroSOI-ULIS)

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We investigate the influence of a visible laser treatment on the electrical performance of CVD-grown graphenebased liquid gate sensors. This method allows to treat locally the graphene sheet, improving the electrical characteristic for biochemical sensing applications. Optimizing the laser exposure, the Dirac point (minimum conductivity voltage) was shifted around 300 mV to lower voltages, together with a decrease of the inter-device electrical variability. These results open the door to use the laser treatment to increase the sensibility and reproducibility of liquid gate graphene-based devices as sensors or biosensors.

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Ways to eliminate PMMA residues on graphene —— superclean graphene

Cited by 68 publications

References 134 publications

Ultra-clean high-mobility graphene on technologically relevant substrates

Ultra-clean high-mobility graphene on technologically relevant substrates

The way towards for ultraflat and superclean graphene

Improved inter-device variability in graphene liquid gate sensors by laser treatment

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