2000
DOI: 10.1143/jjap.39.l1252
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Wavelength-Dispersive Total Reflection X-Ray Fluorescence with High-Brilliance Undulator Radiation at SPring-8

Abstract: Wavelength-dispersive total reflection X-ray fluorescence (WD-TXRF) equipment supported by an energy-dispersive (ED) solid-state detector (SSD) has been developed and installed in the BL16XU Industrial Consortium ID Beamline for Material Research at the SPring-8 synchrotron radiation research facility. Equipment specifications are given and results from our initial experiment are discussed in this paper. In the experiment on the sensitivity of detection of metallic impurities on a Si wafer, the lower limit of … Show more

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Cited by 16 publications
(6 citation statements)
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“…Synchrotron radiation based X-ray fluorescence (SR-XRF) and total reflection X-ray fluorescence (SR-TXRF) techniques are the examples of such trends, where parts per trillion (ppt) level or, in absolute mass, femto gram detection sensitivities have been achieved. [22][23][24] Normally, XRF techniques are comparative in nature and type-standards are generally used to calibrate the spectrometers. Similarly, synthetic standards are employed to determine the DLs.…”
Section: Introductionmentioning
confidence: 99%
“…Synchrotron radiation based X-ray fluorescence (SR-XRF) and total reflection X-ray fluorescence (SR-TXRF) techniques are the examples of such trends, where parts per trillion (ppt) level or, in absolute mass, femto gram detection sensitivities have been achieved. [22][23][24] Normally, XRF techniques are comparative in nature and type-standards are generally used to calibrate the spectrometers. Similarly, synthetic standards are employed to determine the DLs.…”
Section: Introductionmentioning
confidence: 99%
“…The first time use of a wavelength dispersive spectrometer in a TXRF arrangement was reported by Awaji et al 135 This was carried out at the SPring-8 Beamline BL16XU, which is the most brilliant source currently available and is, therefore, highly suitable for the exploitation of the WD technique. The reported detection limits for metallic impurities on silicon wafer surfaces were 10 9 atoms cm 22 or 100 fg in absolute mass.…”
Section: Total Reflection X-ray Fluorescence Spectrometry (Txrf)mentioning
confidence: 99%
“…In total reflection X‐ray fluorescence (TXRF) analysis, monochromatic excitation effectively reduces the spectral background originating from air, a sample holder and the sample itself, and monochromatic X‐rays from a high power X‐ray source are usually used to improve detection limits. By using a monochromatic synchrotron radiation, detection limits in the femtogram range (1 fg = 10 −15 g) were achieved. On the other hand, we have developed portable TXRF spectrometers using white X‐rays (i.e., continuum X‐rays and characteristic X‐rays or continuum X‐rays from an X‐ray tube) from a 1–5 W X‐ray tube.…”
Section: Introductionmentioning
confidence: 99%