The effect of the addition of an external source of correlated noise on\ud
the electron transport in silicon MOS inversion layer, driven by a static\ud
electric field, has been investigated. The electron dynamics is simulated by\ud
a Monte Carlo procedure which takes into account non-polar optical and\ud
acoustic phonons. In our modelling of the quasi-two-dimensional electron\ud
gas, the potential profile, perpendicular to the MOS structure, is assumed\ud
to follow the triangular potential approximation. We calculate the changes\ud
in both the autocorrelation function and the spectral density of the velocity\ud
fluctuations, at different values of noise amplitude and correlation time.\ud
The findings indicate that, the presence of a fluctuating component added\ud
to the static electric field can affect the total noise power, i.e. the variance\ud
of the electron velocity fluctuations. Moreover, this effect critically depends\ud
on both the amplitude of the driving electric field and the noise parameters