High-Power Diode Laser Technology XX 2022
DOI: 10.1117/12.2610727
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Volume manufacturing of high-power diode lasers using 6” wafers

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Cited by 4 publications
(3 citation statements)
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“…Structure optimized laser diodes with 980-nm wavelength, 230 μm emitter width and 4.5mm cavity length are fabricated in Suzhou Everbright Photonics Co., Ltd. established 6" GaAs wafers integrated production line [14]. The laser diode layer structure is grown using MOCVD reactors with further process development for high uniformity and better control.…”
Section: Device Performancementioning
confidence: 99%
“…Structure optimized laser diodes with 980-nm wavelength, 230 μm emitter width and 4.5mm cavity length are fabricated in Suzhou Everbright Photonics Co., Ltd. established 6" GaAs wafers integrated production line [14]. The laser diode layer structure is grown using MOCVD reactors with further process development for high uniformity and better control.…”
Section: Device Performancementioning
confidence: 99%
“…The cladding layers on both sides are made of Al 0.65 Ga 0.35 As material. The device is prepared using metal-organic chemical vapor (MOCVD) epitaxial growth technique and is further fabricated through photolithography to form single emitters with a length of 5mm and a width of 100µm [48]. The back facet of the device is coated with a high reflectivity film of 99.9%, while the front facet has a 1.5% antireflection film.…”
Section: Methodsmentioning
confidence: 99%
“…Innovative or optimized epitaxial structures have shown advantages for a continuous power increase of GaAs-based LDs [10], [19], [20], [21], [22], [23], [24]. A 9xx-nm high-power LD with 230 μm emitter width was reported to achieve 45 W at 25 • C [25]. Improving the operating power and PCE of the LDs can reduce the cost of the laser systems.…”
mentioning
confidence: 99%