Metal-organic chemical vapor deposition (MOCVD) (also called metal-organic chemical vapor phase epitaxy (MOVPE) to emphasize the crystallographic relationship) has been, for a long time, one of the most commonly employed techniques in the microelectronics industry for the realization of high-performance electronic and optoelectronic devices [RAZ 89]. Besides the III-V and silicon-based semiconductors, a wide variety of functional materials can be achieved by using MOCVD, including II-VI semiconductors, oxides, magnetic compounds, etc. A large number of elements (from columns I-VII, as well as transitions metals) can be commercially supplied under several organometallic forms with a high purity, thus enlarging the field of potential future applications. That makes MOCVD a technique of choice for developing original materials and/or architectures, from the basic research to the industrial fabrication. The ability to transport chemical species from the bubbler to the reactor, the accurate control of the partial pressures (reactants and dopants), and the high uniformity and reproducibility that are obtained over large areas constitute the main advantages of MOCVD.II-VI semiconductors including selenides, tellurides and sulfides have been widely grown in the past few decades for a large number of applications in IR, visible and UV emitting devices, single photon sources, high energy detectors and solar cells, etc. More recently, the MOCVD growth of oxide compounds in the (Zn, Mg, Cd, Mn)-O system has attracted much research attention, motivated by a unique combination of physical properties in zinc oxide (ZnO)-based materials, which paves the way for original realizations in optoelectronics, sensors, energy harvesting Chapter written by Vincent SALLET.Wide Band Gap Semiconductor Nanowires 1: Low-Dimensionality Effects and Growth, First Edition. Edited by Vincent Consonni and Guy Feuillet.