The demand for atomic-scale analysis without serious damage to the specimen has been increasing due to the spread of applications with light-element three-dimensional ͑3D͒ materials. Low voltage electron diffractive imaging has the potential possibility to clarify the atomic-scale structure of 3D materials without causing serious damage to specimens. We demonstrate low-voltage ͑30 kV͒ electron diffractive imaging of single-wall carbon nanotube at a resolution of 0.12 nm. In the reconstructed pattern, the intensity difference between single carbon atom and two overlapping atoms can be clearly distinguished. The present method can generally be applied to other materials including biologically important ones. © 2011 American Institute of Physics. ͓doi:10.1063/1.3582240͔Application of light element materials is rapidly increasing due to the growing demand for energy devices ͑e.g., lithium ion batteries and fuel cells͒ and postsilicon electronics ͑made of, for instance, carbon nanotubes, and graphenes͒. The importance of atomic-scale observation using lowvoltage electron beams for imaging the radiation-sensitive materials has also been increasing because the physical properties of the materials are closely linked to their atomic structures. Although, electron microscopes with spherical aberration correctors are widely used in the atomic scale analysis, 1,2 to apply them at low-voltage, especially below few tens of kilovolts, it is required to correct some additional aberrations such as chromatic and higher-order aberrations. 3,4 Moreover, even if an aberration corrector is used, the increasing of numerical aperture of imaging ͑or probe forming͒ lens decreases the depth of focus, which makes three-dimensional ͑3D͒ structure observation difficult. Electron-diffractive imaging 5-12 with iterative phase retrieval ͑iteration procedures͒ 13-15 has reconstructed atomic-level specimen structures and has a capability of imaging 3D structures. However, most of these reconstructions have been executed with high-voltage beams which cause serious knock-on damage. 16,17 To date, a suitable method for imaging 3D materials composed of light elements with atomic-level resolution and without causing serious damage to the specimen is not yet available. Here, we report low-voltage ͑at 30 kV͒ electron diffractive imaging by using a scanning electron microscope ͑SEM͒ based dedicated microscope, 11 and concomitant developed iteration procedures 18,19 for determining the atomic structure without seriously damaging the specimen. A singlewall carbon nanotube ͑SWCNT͒, 20 which is a well-known radiation-sensitive material, has been selected as a representative specimen with 3D structure consisting of light elements.Low voltage diffractive imaging was executed by using the dedicated microscope 11 based on a conventional SEM ͑S-5500, Hitachi High-Technologies Corp.͒ with a cold field emission gun. As with previous phase retrieval works on inline holography, 17,21-24 high coherence of the source ͑namely, small size of the electron source͒ is essen...