2020
DOI: 10.1016/j.solmat.2020.110424
|View full text |Cite
|
Sign up to set email alerts
|

Visible-light activation of low-cost rutile TiO2 photoanodes for photoelectrochemical water splitting

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 14 publications
(2 citation statements)
references
References 47 publications
0
2
0
Order By: Relevance
“…Bialuschewski and coworkers 186 used a plasma‐enhanced chemical vapor deposition (PECVD) process combined with a post‐synthesis annealing step to produce TiO 2 and Fe 2 O 3 photoanode materials on a Ti substrate. Recently, as reported by Barczuk et al, 201 metallic Ti plates were thermally oxidized and chemically etched to form rutile TiO 2 photoanodes, which had an increased photocurrent (0.9 mA/cm 2 at 1.23 V vs. RHE) under AM 1.5 illumination.…”
Section: Advanced Substrates Used In Water‐splitting Photoanodesmentioning
confidence: 90%
“…Bialuschewski and coworkers 186 used a plasma‐enhanced chemical vapor deposition (PECVD) process combined with a post‐synthesis annealing step to produce TiO 2 and Fe 2 O 3 photoanode materials on a Ti substrate. Recently, as reported by Barczuk et al, 201 metallic Ti plates were thermally oxidized and chemically etched to form rutile TiO 2 photoanodes, which had an increased photocurrent (0.9 mA/cm 2 at 1.23 V vs. RHE) under AM 1.5 illumination.…”
Section: Advanced Substrates Used In Water‐splitting Photoanodesmentioning
confidence: 90%
“…TiO2 is a multifunctional material, best known for its photocatalytic and photoelectrochemical properties (water splitting), [1] , [2] , [3] , [4] , [5] but with other emerging applications, most particularly as a charge storage material in Li + or H + batteries. [6] , [7] , [8] , [9] , [10] , [11] TiO2 is used under a great variety of forms: nanoparticles, mesoporous structures, or compact films according to the sought application.…”
Section: Introductionmentioning
confidence: 99%