Water-rich conditions during titania atomic layer deposition in the 100 °C-300 °C temperature window produce films with TiIV oxidation state but large H and O content variations

Low-Temperature Route to Direct Amorphous to Rutile Crystallization of TiO2 Thin Films Grown by Atomic Layer Deposition

“…It should be noted that the broader peak and a high binding energy tail of the O 1s spectra could be attributed to hydroxyl groups. 13,37 However, the concentration of possible hydroxyl groups was too low to be reliably differentiated from the O 1s spectra, and no difference was observed between the growth temperatures.…”

“…The narrower O 1s linewidth is attributed to the lower nitrogen concentration and higher degree of crystalline order for the 200 °C grown sample after the PDA. It should be noted that the broader peak and a high binding energy tail of the O 1s spectra could be attributed to hydroxyl groups. , However, the concentration of possible hydroxyl groups was too low to be reliably differentiated from the O 1s spectra, and no difference was observed between the growth temperatures.…”

“…Indeed, Xia et al recently studied the same TDMAT + H 2 O ALD process and, by using elastic recoil detection analysis (ERDA), observed elevated hydrogen concentration in ALD TiO 2 grown at 100 °C (H/Ti = 0.5) compared to the film grown at 225 °C (H/Ti = 0.1). 37 The difference in the hydrogen content was found to follow the same growth temperature trend with N-bearing TDMAT fragments.…”

A theoretical study on the surface reaction of tetrakis(dimethylamino)titanium on titanium oxide

“…2 The ALD of titanium oxide (TiO 2 ) has been extensively studied for various applications, such as catalysis, [3][4][5] photovoltaic devices, [6][7][8] photoelectrolysis, 9,10 photochemical hydrogen production, 11,12 sensors, [13][14][15] and high-k dielectrics. 16 In particular, a low-temperature ALD process is required for applications involving substrates that are sensitive to high temperatures, such as flexible displays, 17 or biomaterial functionalization. 18,19 Tetrakis(dimethylamino)titanium (TDMAT, Ti(NMe 2 ) 4 ) [20][21][22][23][24] is one of the most popular titanium precursors at low processing temperatures, ranging from room temperature to 225 1C.…”